Selective and localized laser annealing effect for high-performance flexible multilayer MoS2 thin-film transistors

We report the use of ultra-short, pulsed-laser annealed Ti/Au contacts to enhance the performance of multilayer MoS2 field effect transistors （FETs） on flexible plastic substrates without thermal damage. An analysis of the temperature distribution, based on finite difference methods, enabled understanding of the compatibility of our picosecond laser annealing for flexible poly（ethylene naphthalate） （PEN） substrates with low thermal budget （〈 200 ℃）. The reduced contact resistance after laser annealing provided a significant improvement in transistor performance including higher peak field-effect mobility （from 24.84 to 44.84 cm2-V-l.s-1）, increased output resistance （0.42 MΩ at Vgs- Vth = 20 V, a three-fold increase）, a six-fold increase in the self-gain, and decreased sub- threshold swing. Transmission electron microscopy analysis and current-voltage measurements suggested that the reduced contact resistance resulted from the decrease of Schottky barrier width at the MoS2-metal junction. These results demonstrate that selective contact laser annealing is an attractive technology for fabricating low-resistivity metal-semiconductor junctions, providing important implications for the application of high-performance two-dimensional semicon- ductor FETs in flexible electronics.     

Interstitial Mo‐Assisted Photovoltaic Effect in Multilayer MoSe2 Phototransistors

Thin‐film transistors (TFTs) based on multilayer molybdenum diselenide (MoSe₂) synthesized by modified atmospheric pressure chemical vapor deposition (APCVD) exhibit outstanding photoresponsivity (103.1 A W^?1), while it is generally believed that optical response of multilayer transition metal dichalcogenides (TMDs) is significantly limited due to their indirect bandgap and inefficient photoexcitation process. Here, the fundamental origin of such a high photoresponsivity in the synthesized multilayer MoSe₂ TFTs is sought. A unique structural characteristic of the APCVD‐grown MoSe₂ is observed, in which interstitial Mo atoms exist between basal planes, unlike usual 2H phase TMDs. Density functional theory calculations and photoinduced transfer characteristics reveal that such interstitial Mo atoms form photoreactive electronic states in the bandgap. Models indicate that huge photoamplification is attributed to trapped holes in subgap states, resulting in a significant photovoltaic effect. In this study, the fundamental origin of high responsivity with synthetic MoSe₂ phototransistors is identified, suggesting a novel route to high‐performance, multifunctional 2D material devices for future wearable sensor applications.     

Low-frequency noise in ambipolar carbon nanotube transistors

Low-frequency noise measurements on individual single-walled carbon nanotube transistors exhibiting ambipolar characteristics have been carried out. With a polymer electrolyte as gate medium, low-frequency noise can be monitored in both p- and n-channel operation of the same nanotube under the same chemical environment. 1/ f noise in the p-channel of polymer electrolyte gated nanotube transistor is similar to that of back gate operation. However, most devices exhibit significantly larger noise amplitude in the n-channel operation that has a distinct dependence on the threshold voltage. A nonuniform energy distribution of carrier trapping/scattering sites is considered to explain these observations.     

Flexible nano-hybrid inverter based on inkjet-printed organic and 2D multilayer MoS2 thin film transistor

We report a novel platform on which we design a flexible high-performance complementary metal–oxide–semiconductor (CMOS) inverter based on an inkjet-printed polymer PMOS and a two-dimensional (2D) multilayer molybdenum disulfide (MoS₂) NMOS on a flexible substrate. The initial implementation of a hybrid complementary inverter, comprised of 2D MoS₂ NMOS and polymer PMOS on a flexible substrate, demonstrates a compelling new pathway to practical logic gates for digital circuits, achieving extremely low power consumption with low sub-1 nA leakage currents, high performance with a voltage gain of 35 at 12 V supply voltage, and high noise margin (larger than 3 V at 12 V supply voltage) with low processing costs. These results suggest that inkjet-printed organic thin film transistors and 2D multilayer semiconducting transistors may form the basis for potential future high performance and large area flexible integrated circuitry applications.     

High‐Performance Flexible Multilayer MoS2 Transistors on Solution‐Based Polyimide Substrates

Transition metal dichalcogenides (TMDs) layers of molecular thickness, in particular molybdenum disulfide (MoS₂), become increasingly important as active elements for mechanically flexible/stretchable electronics owing to their relatively high carrier mobility, wide bandgap, and mechanical flexibility. Although the superior electronic properties of TMD transistors are usually integrated into rigid silicon wafers or glass substrates, the achievement of similar device performance on flexible substrates remains quite a challenge. The present work successfully addresses this challenge by a novel process architecture consisting of a solution‐based polyimide (PI) flexible substrate in which laser‐welded silver nanowires are embedded, a hybrid organic/inorganic gate insulator, and multilayers of MoS₂. Transistors fabricated according to this process scheme have decent properties: a field‐effect‐mobility as high as 141 cm² V^?1 s^?1 and an I_on/I_off ratio as high as 5 × 10⁵. Furthermore, no apparent degradation in the device properties is observed under systematic cyclic bending tests with bending radii of 10 and 5 mm. Overall electrical and mechanical results provide potentially important applications in the fabrication of versatile areas of flexible integrated circuitry.     

Sub-Thermionic Negative Capacitance Field Effect Transistors with Solution Combustion-Derived Hf0.5Zr0.5O2

The fabrication of Hf_0.5Zr_0.5O₂-ferroelectric negative capacitor using solution combustion is presented for the first time. The starting materials used for the solution combustion to form equimolar Hf_0.5Zr_0.5O₂ are to act as both combustible elements and cation sources. Jain's method, which is used for estimating the stoichiometric quantities of precursors in propellant chemistry, has also been modified and applied. The conventional assumption for this method that molecular oxygen does not take part in the reaction is refuted and stoichiometric combustion in the presence of molecular oxygen is proposed. This reaction is followed by post-rapid thermal processing to stabilize the metastable, non-centrosymmetric orthorhombic phase. The thin film stacks, Hf_0.5Zr_0.5O₂/HfO₂, are used to achieve sub-thermionic swing (forward sweep: 25.42  ± 8.05 mV dec⁻¹, reverse sweep: 42.56  ± 4.87 mV dec⁻¹) in MoS₂ negative capacitance field effect transistors with a hysteresis of ≈ 40 mV at 1 nA, resulting in ultra-low-power operation.