Measurement of the Hardness of Thin Films

A method for evaluating the hardness of coatings with nanosize thickness is suggested. The method includes the determination of the hardness of the “coating-substrate” composition by indenting the coating and subsequent computation of the hardness with the use of the additivity rule. This requires determination of the thickness of the coating, of the hardness of the substrate, and of the indentation depth.     

Modelling of Al2O3 Powder Compaction with Hot Pressing in a Rigid Die

Computer modelling of hot pressing is provided. Kinetics are described for compaction during hot pressing in a rigid die, and the change in density distribution, irreversible solid phase strain accumulation, and equivalent stresses are studied by means of the finite element method. Shrinkage during the preparation of complex-shaped articles by hot pressing pure Al₂O₃ powder in a graphite die without a protective atmosphere and the physicomechanical properties of the finished article are studied. Calculated and experimental results agree satisfactorily.     

Semiconductor Voltage Regulators-Stabilizers for Distribution Networks

Power Technology and Engineering - The article describes the issues of the operation of semiconductor regulators-stabilizers of alternating voltage for distribution networks (PRSPN). The relevance...     

High-Speed Semiconductor Voltage Regulators for On-Load Distribution Network Transformers

Power Technology and Engineering - The paper presents the results of developing a high-speed semiconductor transformer voltage regulator (STVR) intended for a real-time voltage regulation of 0.4 kV...     

Role of atomic hydrogen diffusion in a hydrogen flame

A numerical modeling study of the propagation of a laminar flat homogeneous gas flame has shown that in a hydrogen-air flame, a rapid increase in the concentration of OH radicals begins in the range of low temperatures and the concentration profile has two maxima. The first maximum in the low-temperature region of the front is related to the diffusion of H atoms, formation of HO₂ radicals, and the quadratic branching reaction H + HO₂ → OH + OH. The second maximum in the OH concentration profile is due to the classical high-temperature branching reactions H + O₂ → OH + O and O + H₂ → OH + H. __________ Translated from Fizika Goreniya i Vzryva, Vol. 43, No. 2, pp. 3–9, March–April, 2007.