3.
Recent advances in the fabrication of high-
T
c
superconducting thick films demand processing techniques which can eliminate film/substrate interdifiusion that occurs during subsequent post-annealing heat treatment after the film is deposited, thereby limiting the application of the thick films for devices. The present study evaluates laser annealing techniques for plasma-deposited Y-Ba-Cu-O thick films using a high-energy CO
2 laser (10.6
m) in a continuous wave mode. The results are compared with those obtained by conventional furnace annealing techniques necessary for post-heat treatment of as-deposited superconducting thick films. The high-
T
c
superconducting phase is recovered by cationic diffusion during subsequent post-annealing heat treatment. Crystallographic phases and microstructural characterization have been performed using XRD, SEM, and EPMA analytical techniques. The significance of the technology lies in the elimination of film/substrate interdiffusion problems, thereby resulting in high-quality superconducting thick films. The technology will significantly reduce the post-annealing times usually required by conventional furnace annealing techniques.
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