排序方式: 共有14条查询结果,搜索用时 15 毫秒
1.
2.
3.
ZnO nanowires deposited on Si substrates were prepared by thermal evaporation of a mixture of ZnO and carbon powder. Ag ions with an energy of 63 keV and a dose of 5×1015 ions/cm-2 were implanted into the as-prepared ZnO nanowires. After ion implantation, the Ag-implanted ZnO nanowires were annealed in air at different temperatures from 600℃ to 1000℃. Effects of ion implantation and thermal annealing on the structural and photoluminescent (PL) properties of the ZnO nanowires were investigated by transmission electron microscopy (TEM), selected area energy dispersive X-ray spectroscopy (SAEDX), X-ray diffraction (XRD), and fluorescence spectrophotometry. TEM, HR-TEM, and SAEDX analyses demonstrated that efficient doping of Ag was achieved by ion implantation and the subsequent annealing process. XRD patterns revealed that the hexagonal wurtzite structure of ZnO nanowires was maintained after ion implantation. Photoluminescent emissions of ZnO nanowires were decreased significantly by Ag implantation but could be recovered by thermal annealing. The mechanism of the influence of ion implantation and annealing on the PL intensity was assessed. 相似文献
4.
5.
6.
采用热化学气相沉积法(thermal chemical vapor deposition,TCVD)在经过高温氨气处理后的硅基铁纳米薄膜表面实现片状碳纳米带的催化生长.通过场发射扫描电子显微镜(field emission scanning electron microscopy,FESEM)的观察可知,生成的碳材料是一种准二维材料,表面具有垂直于其长度方向的纹理,厚(z方向)约几十纳米,宽(Y方向)几百纳米,类似于一种"搓板"状的结构.而其宽度沿着其长度方向则有较大的变化,时宽时窄,没有固定的规律.这种带状碳纳米纤维材料的边缘光滑,比中间略宽,类似于一种镶边结构.通过高分辨透射电子显微镜(high resolution transmission electron microscopy,HRTEM)的观察可知,碳纳米带的碳层沿着垂直于碳纳米带长度的(002)方向有统一的排列,其边缘都弯曲折叠成封闭结构.有序排列的碳层被层错和断点分割成许多微区.在对催化剂研究的基础上,本文认为片状碳纳米带的生长是通过碳原子在片层状催化剂颗粒中的扩散、析出来实现的.碳层从催化剂片层侧面中一层一层地析出,形成带状外观. 相似文献
7.
以Au薄膜为催化剂、ZnO与碳混合粉末为反应源,采用碳热还原法在单晶Si衬底上制备了ZnO纳米线阵列.通过扫描电子显微镜( SEM)、X射线衍射仪(XRD)、荧光分光光度计对样品的表征,研究了反应源温度对ZnO纳米线阵列的定向性和光致发光性能的影响.样品在源温度920℃条件下沿(002)方向择优生长,定向性最好,温度过低不利于ZnO纳米线阵列密集生长,而温度过高导致Zn原子二次蒸发,因而也不利于纳米线阵列的定向和择优生长;样品在源温度880℃有最强的近紫外带边发射,表明温度过高和过低都不利于ZnO晶体结构的优化;由于ZnO纳米线在缺氧氛围下生长,氧空位是缺陷存在的主要形式,因此所有样品都有较强的绿光发射.温度升高导致纳米线生长速度提高而增加了氧空位缺陷数量,从而使样品绿峰强度增强并在源温度920℃时达最大值,但温度的进一步升高可导致ZnO纳米线表面Zn元素的蒸发而降低氧空位缺陷的数量,从而抑制绿峰强度. 相似文献
8.
9.
10.