Self-identification algorithm for zeolite-based thermal capacity gas sensor

Microsystem Technologies - We demonstrate a new operation mode of thermal gas sensor based on thermal capacity extraction with identification algorithm. The system is a silicon microstructure...     

Single-Photon Detection System for Quantum Optics Applications

We describe the design and characterization of a fiber-coupled double-channel single-photon detection system based on superconducting single-photon detectors (SSPD), and its application for quantum optics experiments on semiconductor nanostructures. When operated at 2-K temperature, the system shows 10% quantum efficiency at 1.3-mum wavelength with dark count rate below 10 counts per second and timing resolution <100 ps. The short recovery time and absence of afterpulsing leads to counting frequencies as high as 40 MHz. Moreover, the low dark count rate allows operation in continuous mode (without gating). These characteristics are very attractive-as compared to InGaAs avalanche photodiodes-for quantum optics experiments at telecommunication wavelengths. We demonstrate the use of the system in time-correlated fluorescence spectroscopy of quantum wells and in the measurement of the intensity correlation function of light emitted by semiconductor quantum dots at 1300 nm.     

Combined spectroscopic ellipsometry and attenuated total reflection analyses of Al2O3/HfO2 nanolaminates

The microstructure of thin HfO₂-Al₂O₃ nanolaminate high κ dielectric stacks grown by atomic vapor deposition has been studied by attenuated total reflection spectroscopy (ATR) and 8 eV spectroscopic ellipsometry (SE). The presence of Al₂O₃ below HfO₂ prevents the crystallisation of HfO₂ if an appropriate thickness is used, which depends on the HfO₂ thickness. A thicker Al₂O₃ is required for thicker HfO₂ layers. If crystallisation does occur, we show that the HfO₂ signature in both ATR and 8 eV SE spectra allows the detection of monoclinic crystallites embedded in an amorphous phase.     

High κ for MIM and RRAM applications: Impact of the metallic electrode and oxygen vacancies

Influence of metallic electrode and oxygen vacancies in MIM capacitors and MIM RRAM high κ based devices is studied. For both MIM capacitors and MIM RRAM it is shown that the electrode composition strongly influences the overall behavior of the devices and more precisely, the capacitance–voltage curve (nonlinearities) for MIM capacitors, and the switching mechanism (SET/RESET) for MIM RRAM. Best results for HfO₂ RRAM are obtained with Pt as bottom electrode instead of TiN while very low capacitance variations are observed for high work function electrodes, or more precisely electrodes with low oxygen affinity. These evolutions are related to the oxygen vacancies concentration and migration to the cathode electrode/high κ interface.