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Mitsuhiro Horade Sommawan Khumpuang Kazuya Fujioka Susumu Sugiyama 《Microsystem Technologies》2007,13(3-4):215-219
We have investigated and report in this paper the factors influencing the deformation caused by the dependence between the
absorbed X-ray energy on the resist and the shape of the absorber on the X-ray mask. Based on the measurement of errors that
occurred during the transferring process between the 2-D shape of mask pattern and the resulting wall of the fabricated 3-D
structure, we have developed newly useful graphical data on the absorbed X-ray energy, dosage, and shape of a microstructure.
As a result, it is being reported as a method for compensation for the deformed shape after the fabrication of a quadruplets-microneedle.
We have considered a number of factors affecting the deformation and finally realized that the effect of a dose–depth nonlinear
curve is the most possible cause. Without the compensation of the mask design, we could observe the deformed shapes of the
sloped sidewall on the exposed structures. Polymethylmethacrylate microneedle structures fabricated by X-ray lithography with
an additional plane-pattern to cross-section transfers technique are directly influenced by the absorber on the X-ray mask
pattern. The sidewall of the microneedle was improved by changing the mask pattern from a double right-triangular pattern
to a double semi-circular pattern, modeled by comparing the results from a mask-pattern and the actual structure. 相似文献
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Mitsuhiro Horade Sommawan Khumpuang Susumu Sugiyama 《Microsystem Technologies》2008,14(9-11):1695-1698
Microfabrication technique using SR ablation for 3-D polytetrafluoroethylene (PTFE) structure is reported in this work. First of all, we investigated necessary basic data for the fabricated structure like the processing depth and the etching rate, etc. And, the exposure energy distribution was given to the surface of polytetrafluoroethylene by using the plane pattern to cross-section transfer (PCT) technique, 3-D microstructures was fabricated. To establish three dimension of highly accurate PTFE processing technology, we are researching the application to the device. 相似文献
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Sommawan Khumpuang Mitsuhiro Horade Kazuya Fujioka Susumu Sugiyama 《Microsystem Technologies》2007,13(3-4):209-214
A novel fabrication method for LIGA (from the German “Lithographie”, “Galvanik”, and “Abformung”) microneedles with through
holes is presented. Such microneedles are in demand by most bio-medical MEMS applications and in some fluidic MEMS applications.
We propose a technique that combines conventional deep X-ray lithography, plane-pattern to cross-section transfer (PCT) process,
and alignment X-ray lithography. The technique provides precise hole alignment with ± 3 μm tolerance. Finite-element simulations
on various hole locations were performed to determine the optimum position. We previously fabricated a microneedle with a
100-μm base and a 300-μm height by a right-triangular mask. The resultant microneedle had a very sharp tip but was excessively
steep, and thus resulted in a very low strength. Improved strength and tip sharpness was consequently achieved by changing
the mask-pattern from a triangular pattern to a polygonal mask and changing the dimensions of the microneedle to have a 300-μm
base with various heights between 350 and 800 μm. Using the proposed technique, we could produce a total of 100 hollow microneedles
on a 5 × 5 mm2 chip. Moreover, we successfully fabricated sharpened microneedles that were stronger than that we have fabricated so far.
The molding process or electroplating and the cost list of the LIGA microneedle will also be included. 相似文献
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