燃煤锅炉除尘专用滤料的开发

介绍机械制造厂燃煤锅炉的烟尘特点,分析滤料失效的原因,提出一套针对该工况的滤料解决方案。介绍针对复杂工况条件所选用的纤维种类以及复合面层原料成分配比的确定,最终选用针刺工艺加工并对该新产品的基本性能进行了测试分析。     

试油井选层压裂新工艺及现场试验

设计新型可洗井封隔器，保障油井有反洗井通道，有效防止封隔器以上砂埋所引发的管柱砂卡事故，并对新型封隔器、控制开关、密封接头、同心大通径压力计托筒等井下工具组合优化。解决了多层油井任意选层压裂、求产、测井温一体化的难题。     

CMOS光接收机主放大器设计

利用CMOS工艺设计一种用于SDH STM 4速率级(622 Mb/s)光纤用户网的光接收机放大电路。此电路由输入/输出缓冲、主放大单元、偏置补偿电路4部分组成。通过直接耦合技术提高增益,降低功耗;利用有源电感负载提高系统带宽。采用商用SmartSpice电路仿真软件和CSMC HJ 0.6μm工艺参数对该电路进行仿真。结果表明,该电路在5 V工作电压下中频增益为81 dB,3 dB带宽为470 MHz。     

UC3875在超声电源功率控制系统中的应用

根据超声波发生器的功率控制系统原理 ,阐述了移相控制策略对超声波发生器输出电压波形的影响 ,介绍了移相控制专用芯片UC3875的电路结构和使用设计方法。     

Effect of Fog and Clouds on the Image Quality in Millimeter Communications

The effect of fog and clouds in millimeter communication is discussed, and the attenuation caused by fog and clouds is reviewed. Signal-to-noise ratio (SNR) of image is derived using relating models of fog and clouds attenuation. According to the relation of image quality and its signal-to-noise ratio, the system behavior is forecasted theoretically. It is shown that the signal-to-noise ratio of receiver at certain transmitter power is inverse with radio wave frequency, from about 70dB at 10GHz to 48dB for fog and 49dB for clouds. The image quality of received signal at certain transmitter power is inverse with radio wave frequency, from about 7 grade at 10GHz to 5.27 grade for fog and 5.37 grade for clouds. The above calculated results are consistent with experimental results.     

Windows系统中两种动态交换数据的方法

本文介绍了Ｗｉｎｄｏｗｓ环境下基于消息的ＤＤＥ和基于动态链接库的ＤＤＥＭＬ的区别，并详细叙述了如何使用ＤＤＥＭＬ编制Ｗｉｎｄｏｗｓ应用程序。     

苯磺隆干悬浮剂技术浅析

通过对苯磺隆干悬浮剂项目的研究,进一步了解干悬浮剂的加工工艺和配方中各种助剂的相互作用;剖析助剂对主要技术指标的影响。     

APT（STLRI）—1.78型单模光纤（缆）连接器简介

利用引进的制造技术和设备,制作出了 APT(STLRI)—1.78型系列化光纤连接器。     

Enhanced light output in nitride-based light-emitting diodes by roughening the mesa sidewall

In this letter, we will report on a nitride-based light emitting diode with a mesa sidewall roughening process that increases light output power. The fabricated GaN-based light-emitting diode (LED) wafers were first treated through a photoelectrochemical (PEC) process. The Ga/sub 2/O/sub 3/ layers then formed around the GaN : Si n-type mesa sidewalls and the bottoms mesa etching regions. Selective wet oxidation occurred at the mesa sidewall between the p- and the n-type GaN interface. The light output power of the PEC treated LED was seen to increase by about 82% which was caused by a reduced index reflectance of GaN-Ga/sub 2/O/sub 3/-air layers, by a rough Ga/sub 2/O/sub 3/ surface, by a microroughening of the GaN sidewall surface, and by a selective oxidation step profile of the mesa sidewall that increases the light-extraction efficiency from the mesa sidewall direction. Consequently, this wet PEC treated process is suitable for high powered nitride-based LEDs lighting applications.