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HCFC(氢氟氯烷烃)制冷剂的替代及实现商品化的工作在当前倍受关注,目前,最有希望的替代制冷剂为HFC(氢氟化烷烃)类的R407C和R410A。本文针对HFC类制冷剂压缩机和系统在设计和商品化过程中的技术课题进行了分析,并力求提出可行的措施。 相似文献
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The influence of the hysteretic behaviour in reactive sputtering with a pure aluminium target in the presence of argon and oxygen plasma on transmittance and surface free energy of aluminium oxide films was investigated by plasma optical emission spectroscopy technology. The evolutions of aluminium, and aluminium oxide emission lines as functions of oxygen flow rate at constant power and pressure were studied. A steep transition from the metallic sputtering to the compound sputtering was observed upon increasing the oxygen flow rate from 0.0 SCCM to above 2.0 SCCM. Then an optimal deposition zone was obtained through analyzing the hysteretic curves of aluminium and aluminium oxide emission lines. The evolution of crystal structures of samples was discerned by X-ray diffraction spectra data. Energy dispersive X-ray spectroscopy data also demonstrate the relationship between the chemical compositions of aluminium oxide films and the hysteretic behaviour. The film deposited between 1.5 SCCM and 2.0 SCCM oxygen flow rate displays an optimal and stoichiometic atomic ratio of O to Al and mass ratio of O to Al. The changes in the transmittance of samples were discovered to depend on the oxygen flow rate by UV-VIS transmittance spectra, and the changes in surface free energy were studied by contact angle measurement. 相似文献
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采用直流磁控溅射的方法,在烧结NdFeB磁体表面制备DyAl合金薄膜,对镀膜样品进行了真空扩散渗(800℃×6h)和时效处理(900℃×2.5h+490℃×5h),研究其耐热性和耐蚀性。经过真空扩散渗及时效处理,磁体的内禀矫顽力Hcj提高14.7%,磁体PCT失重从26.155 mg/cm2降低为1.731 mg/cm2,动态极化曲线显示Dy、Al元素的扩散改变了基体的腐蚀电位和腐蚀电流。结果表明,DyAl薄膜扩散进入NdFeB表层基体中,提高了磁体的耐热性和耐蚀性。 相似文献
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用直流磁控溅射工艺,在NdFeB磁体表面镀Al薄膜,并对镀Al薄膜的磁体进行真空热处理,研究工艺、温度和时间对镀层成分、组织和性能的影响。结果表明:NdFeB镀Al薄膜磁体经650℃,10 min热处理后,综合性能最佳,Al膜层与Nd-FeB磁体在界面产生冶金结合,增强了界面结合力,又保持了Al膜层的完整性、连续性和良好耐蚀性。通过对样品微组织的观察发现,当热处理温度高于650℃时,Al膜层与基体之间产生互扩散,形成新的RFeAlB相,随着温度继续升高,新相的长大,破坏了Al膜层的完整性和连续性,产生许多微缺陷和裂纹,耐蚀性降低。 相似文献
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