Room-temperature laser emission of GaInNAs-GaAs quantum wells grown on GaAs (111)B

In this work, we present room-temperature laser emission at 1.206 /spl mu/m from GaInNAs-GaAs quantum-well (QW) laser diodes (LDs) grown on misoriented GaAs (111)B substrates for the first time. Details of the structure and the molecular beam epitaxial growth of the lasers are discussed. We found that the postgrowth rapid thermal annealing increased the optimum emission, while the in situ self annealing effect in these QWs is almost negligible. The optimum annealing cycle (30 s at 850/spl deg/C) is comparable to that found for the cladding-free GaInNAs single QW samples grown on GaAs (111)B. Finally, the optical and electrical characterization of these LD devices is presented. The LDs show a room-temperature threshold current density of 2.15 kA/cm/sup 2/, with a differential quantum efficiency of 37%, under pulsed conditions.     

Effects of N2 Plasma Pretreatment on the SiN Passivation of AlGaN/GaN HEMT

The impact of in situ low-power plasma pretreatment, prior to silicon-nitride (SiN) deposition, was investigated in AlGaN/GaN high-electron mobility transistors (HEMTs). These studies reveal that the use of plasma in HEMT passivation reduces current-collapse and gate-lag effects. Such treatment is also beneficial to improve gate leakage, and from RF measurements, no degradation of was observed. These beneficial effects of the plasma pretreatment seem to be due to a significant reduction in interface charge density, as shown in this letter using GaN MIS devices, where a decrease of 60% was observed.