等离子体预处理对解淀粉芽胞杆菌生长和α-淀粉酶分泌的影响

本研究采用低真空室温射频等离子体对解淀粉芽胞杆菌CICC 10035进行预处理，通过改变放电功率、处理时间和工作气压等参数，筛选最佳工艺条件，并使用蛋白质组学技术，对差异蛋白质进行生物信息学分析，探讨等离子体预处理对菌体生长和产酶性能的影响。结果表明，等离子体预处理的最佳工艺条件为：放电功率120 W，处理时间15 s，工作气压135 Pa。在最佳条件下，发酵48 h后，α-淀粉酶酶活超过400 U/mL，与对照样相比提高约20%。蛋白组学分析表明，等离子体预处理对菌体的蛋白合成及代谢产生了较强的正效应，尤其在DNA修复和氨基酸合成上，一方面提高了菌体活性，延缓其衰亡过程；另一方面促进了α-淀粉酶在菌体内的合成和分泌。     

Effect of Cold Plasma Treatment on Seed Germination and Growth of Wheat简

This study investigated the effect of cold helium plasma treatment on seed germina- tion, growth and yield of wheat. The effects of different power of cold plasma on the germination of treated wheat seeds were studied. We found that the treatment of 80 W could significantly improve seed germination potential （6.0%） and germination rate （6.7%） compared to the control group. Field experiments were carried out for wheat seeds treated with 80 W cold plasma. Com- pared with the control, plant height （20.3%）, root length （9.0%） and fresh weight （21.8%） were improved significantly at seedling stage. At booting stage, plant height, root length, fresh weight, stem diameter, leaf area and leaf thickness of the treated plant were respectively increased by 21.8%, 11.0%, 7.0%, 9.0%, 13.0% and 25.5%. At the same time, the chlorophyll content （9.8%）, nitrogen （10.0%） and moisture content （10.0%） were higher than those of the control, indicating that cold plasma treatment could promote the growth of wheat. The yield of treated wheat was 7.55 t-ha-1, 5.89% more than that of the control. Therefore, our results show that cold plasma has important application prospects for increasing wheat yield.     

等离子体预处理对解淀粉芽孢杆菌生长和α-淀粉酶分泌的影响

采用低真空室温射频等离子体对解淀粉芽孢杆菌CICC 10035进行预处理,通过改变放电功率、处理时间和工作气压等参数筛选工艺条件,并使用蛋白质组学技术对差异蛋白质进行生物信息学分析,探讨等离子体预处理对菌体生长和产酶性能的影响.得到的等离子体预处理最佳工艺条件为:放电功率120 W,预处理时间15 s,工作气压135 Pa.在该条件下,发酵48 h后,α-淀粉酶酶活超过400 U/mL,与对照样相比提高约20％.蛋白组学分析表明,等离子体预处理对菌体的蛋白合成及代谢产生了较强的正效应,尤其在DNA修复和氨基酸合成上,一方面提高了菌体活性,延缓了其衰亡过程;另一方面促进了α-淀粉酶在菌体内的合成和分泌.     

射频等离子体对PTFE的表面改性

通过射频等离子体对聚四氟乙烯（PTFE）表面的作用，实现了PTFE材料表面的化学改性和其润湿性的提高。研究了不同反应条件对PTFE表面湿润性的影响；通过测定样品膜对水的接触角θ（投影法），评价其表面亲水性的变化；使用了X射线光电子能谱（XPS）以及扫描电镜（SEM）对样品进行了表面结构的分析；通过对材料表面进行丙烯酸接枝，评价了各因素对时效性的影响；初步探讨了真空紫外辐射对表面改性的影响。结果表明：改性后PTFE表面的润湿性明显得到改善，该设备与技术在工业应用方面非常具有推广价值。     

ITTO薄膜的耐腐蚀稳定性和表面能研究

为了提高透明导电薄膜的综合性能,采用磁控溅射法制备了Ta掺杂ITO(ITTO)薄膜,对薄膜在不同模拟环境介质溶液中的电学稳定性及电化学行为进行了测试,分析了处于特定介质环境中薄膜的相对电阻变化和表面形貌;基于薄膜表面接触角的测量,计算了薄膜的表面能和极性度。结果表明:薄膜在各环境介质中都发生了自钝化现象,ITTO薄膜显示了较好的化学稳定性和热稳定性,除了晶体结构的影响之外,稳定性较好的氧化钽也提高了薄膜的化学稳定性和热稳定性;掺杂使得薄膜的接触角减小,表面能增大,表面极性度增加,薄膜的表面状态和靠近费米能级处引入d轨道的活性高价原子的存在是促进表面能提高的主要原因。     

良师益友

几年前我根据贵刊介绍,买了一款高级袖珍相机,觉得其性能与贵刊所言相符,使用起来得心应手,无论是成像及色还原率都是优秀的。用了一年多后,因取景器出现故障,与供应商联系后,供应商很快就同意换一个新的相机。 新相机使用了两年多后,取景器又出现了与第一台相机故障。再次与供应商联系,他却不同意更     

Effects of low-vacuum helium cold plasma treatment on seed germination,plant growth and yield of oilseed rape

The effects of low-vacuum helium cold plasma treatment on the seed germination,plant growth and yield of oilseed rape(Brassica napus L.cv.Zhongshuang 9) were investigated.Seeds were exposed to low-vacuum helium cold plasma ranging from 0–120 W for 15 s.Cold plasma increased the germination,plant growth and yield of oilseed rape,and the treatment of 100 W provided the best result.The germination rate,germination and vigor indices,and uniformity of emergence were improved by cold plasma treatment.Cold plasma raised the relative conductivity and water uptake,and reduced the apparent contact angle.The characteristics of plant growth,including plant height,stem diameter,dry weights of shoot and root at the seedling,bolting and flowering stages were increased by the cold plasma treatment.Yield components,including pod numbers per plant and 1000 seed weights were increased by the cold plasma treatment.Furthermore,the yield per plant increased by 28.20%.These results suggest that cold plasma treatment has the potential to improve the yield of oilseed rape through the enhancement of permeability,wettability and capacity of water uptake of the seeds,seed germination and plant growth.