The surface carboxyl group of carbonaceous microspheres effects on the synthesis and structure of SiOC ceramics

In this study, C/SiOC and C/SiO₂ composites were prepared by using carbonaceous microspheres with different surface functional groups. Carbonaceous microspheres based on hydrothermal reaction of glucose contains hydroxyl group, while the surface carboxyl group increases after NaOH etching. The hydroxyl group increases the oxygen-enriched structural units of SiOC ceramics, and the C spheres are closely enwrapped in SiOC matrix after pyrolysis at 900 °C. However, the interfacial reaction of surface carboxyl with Si–OH results in the formation of cristobalite SiO₂, and C spheres are not only encased inside the SiOC matrix, but also dispersed outside of SiOC ceramics. After removal of C via calcination at 500 °C for 5 h, C/SiOC and C/SiO₂ composites are transformed into amorphous SiO₂ and cristobalite SiO₂, respectively. The thermogravimetric analysis indicates the oxidation resistance of SiOC is superior to that of C and SiO₂.     

Study of metal assisted anisotropic chemical etching of silicon for high aspect ratio in crystalline silicon solar cells

Textured surface is commonly used to enhance the efficiency of silicon solar cells by reducing the overall reflectance and improving the light scattering. In this study, a comparison between isotropic and anisotropic etching methods was investigated. The deep funnel shaped structures with high aspect ratio are proposed for better light trapping with low reflectance in crystalline silicon solar cells. The anisotropic metal assisted chemical etching (MACE) was used to form the funnel shaped structures with various aspect ratios. The funnel shaped structures showed an average reflectance of 14.75% while it was 15.77% for the pillar shaped structures. The average reflectance was further reduced to 9.49% using deep funnel shaped structures with an aspect ratio of 1:1.18. The deep funnel shaped structures with high aspect ratios can be employed for high performance of crystalline silicon solar cells.     

Isolation of the effect of the hairy layer length on the mechanical properties of waterborne coatings

The effect of the acidic hairy layer length on the interdiffusion of polymer between particles and as a consequence on the mechanical properties of the films produced from waterborne coatings has been studied. In order to isolate this effect, latexes with the same particle diameter and molecular weight but stabilized with poly(acrylic acid)-block-poly(butyl acrylate) (PAA-b-PBA) block copolymers of controlled and different lengths were prepared. Tensile strength measurements showed at the macroscopic level that the presence of AA chains in the particle surface reduced the mechanical properties of the films dried at room temperature, being its effect worse the longer the AA chain length. Higher annealing temperatures erased the negative effect of the acidic hairy layer on mechanical properties. The neutralization with NaOH instead of with NH₄OH also led to worse mechanical properties. These macroscopic results were supported by Fluorescence Resonance Energy Transfer (FRET) experiments that showed that at the microscopic level, the extent of interdiffusion occurred slower when the AA chains in the particles surface increased, the annealing temperature was lower and when NaOH was used as neutralizing agent instead of NH₄OH.     

等离子体刻蚀工艺控制模型分析

讨论了主因素分析法以及神经网络法在等离子体刻蚀工艺中的应用.结果表明主元素分析法可以实现对数据的压缩,而神经网络算法则显示出比传统的统计过程控制算法更好的准确性.     

水力旋流器用于酸性油分离的研究

采用自行研制的水力旋流器进行了降低酸性油酸值的工业实验。实验表明,水力旋流器可将酸值为13．3 mgKOH/g的酸性油酸值降至12 mgKOH/g左右,从而能满足工业生产要求,沉降时间大为缩短。     

真空微电子荧光平板显示器件的实验研究

真空微电子荧光平板显示器件的实验研究刘杰明，李志能，陈秀峰（浙江大学信息与电子工程学系）关键词：真空微电子，反应离子刻蚀一、引言近十年来，随着真空微电子学的崛起，利用微细加工技术，使真空元器件集成化和高性能化已成为可能，一种新型场致发射阵列真空荧光平...     

80kt/a硫磺回收装置国产化设计

介绍了无在线炉硫回收工艺的基本原理、技术特点和催化剂使用情况。已投用的工业装置运行结果证明 ,用该工艺设计的硫磺回收装置 ,硫回收率和尾气净化度高 ,投资少 ,能耗低 ,流程简单 ,操作控制方便 ,社会效益和经济效益显著 ,适用于同类装置的新建和改扩建项目 ,市场前景广阔。     

用化学腐蚀制备多孔硅太阳电池减反射膜的研究

采用HF HNO3溶液化学腐蚀 ,在硅片上制备减反射效果优良的多孔硅太阳电池减反射膜 ,借助原子力显微镜 (AFM)和X光电子谱 (XPS)对其表面形貌和成分进行观察 ,发现该膜与电化学阳极腐蚀得到的多孔硅具有相似性 ,其主要成分为非化学配比的硅的氧化物SiOx(X <2 )。采用带积分球的光度分光计 ,测得形成多孔硅减反射膜后 ,硅片表面反射率大大下降 ,,在波长 330～ 80 0nm范围反射率只有 1 5～ 2 9%。研究指出这种强减反射作用 ,与多孔硅具有合适的折射率及其多孔特性的光陷阱作用有关     

高分子纳米LB膜的制备及其光刻性能研究

合成并表征了N-十六烷基丙烯酰胺（HDA）和对叔丁基苯酚甲基丙烯酸酯（BPhMA）的共聚物p（HDA-BPhMA）s。当HDA含量较高时，共聚物可在气，液界面上形成稳定，排列紧密的单分子薄膜，并可以Y型膜的方式沉积在各种固体基片上，形成多层均匀的Langrnuir-Blodgett（LB）膜。这种LB膜被成功地应用于光刻，获得了分辨率为0.5μm的LB膜图形。以该图形为抗蚀层，可将图形进一步转移至金属薄膜上，得到分辨率较高的金属图形，在图形转移的过程中，这种LB膜显示出较高的抗蚀性，有望作为纳米抗蚀薄膜材料在亚微米刻蚀领域得到应用。     

Inductively coupled plasma etching of InGaP, AllnP, and AlGaP in Cl2 and BCl3 chemistries

Dry etching of InGaP, AlInP, and AlGaP in inductively coupled plasmas (ICP) is reported as a function of plasma chemistry (BCl₃ or Cl₂, with additives of Ar, N₂, or H₂), source power, radio frequency chuck power, and pressure. Smooth anisotropic pattern transfer at peak etch rates of 1000–2000Å·min^?1 is obtained at low DC self-biases (?100V dc) and pressures (2 mTorr). The etch mechanism is characterized by a trade-off between supplying sufficient active chloride species to the surface to produce a strong chemical enhancement of the etch rate, and the efficient removal of the chlorinated etch products before a thick selvedge layer is formed. Cl₂ produces smooth surfaces over a wider range of conditions than does BCl₃.