Graded Heterojunction of AIGalnP High-brightness Light Emitting Diodes

A simple model of the graded heterojunction in AIGalnP compound semiconductors was introduced to analyze the band profile. The band profiles are analyzed with the different grading ways but the same grading length and under the different doping densities. The effect of the different grading lengths on the surplus of the potential of the spike to the potential of N region are also analyzed under the different doping densities. Through the experiments, it proves that the performances of high brightness light emitting diodes can be improved by the effects of the graded heterojunction.     

隧道再生双有源区AlGaInP发光二极管提取效率的计算

建立了发光二极管提取效率的理论计算模型,分析了影响隧道再生双有源区AlGaInP发光二极管提取效率的主要因素,包括从出光表面出射的光、体内的光吸收损耗、衬底对光的吸收损耗、金属电极对光的吸收损耗,模拟计算了隧道再生双有源区AlGaInP发光二极管的提取效率,计算得到隧道再生双有源区AlGaInP LED管芯的上有源区和下有源区提取效率分别为5．24％和9．16％。     

氧化钨薄膜对发光二极管特性的影响研究

氧化钨薄膜具有适中的光学带隙、折射率及高功函数等半导体特性,本文采用溅射法(Sput-tering)制备氧化钨薄膜测试其光电特性,使用AFM、XRD观察薄膜外观结构与晶体状态,应用XPS、UPS表征薄膜的化学计量组分及薄膜功函数,并将此薄膜应用于AlGaInP发光二极管器件中,以增加与p-GaP欧姆接触特性,增加载流子...     

新型表面再构的倒装AlGaInP LED

研究一种表面再构的具有全方位反光镜(ODR)结构的倒装AlGaInP半导体发光二极管(LED)。通过湿法腐蚀方法再构N-AlGaInP盖层表面,形成类金字塔的表面结构,使不同角度入射的光有更多的机会出射。比较了表面再构LED与常规LED的电、光学特性,在注入电流为20 mA时,经过表面再构LED的轴向光强和输出光功率是常规LED的1.5倍,表面再构后大大提高了LED的外量子效率,减少了LED内部热量的积累,提高了LED芯片的可靠性。     

670nm发光二极管材料的MOCVD外延生长

重点介绍了670nm LED材料的结构与制备方法,用MOCVD方法生长了较高压应变的670nm多量子阱。分析比较了670nm量子阱室温光荧光谱线宽度的影响因素,指出室温光荧光主要来源于带-带复合,荧光谱线宽度的减小是应变量子阱轻重空穴能级分离的结果,并不意味着量子阱界面质量的改进。同时介绍了二乙基锌(DEZn)的掺杂技术和掺杂浓度,通过优化掺杂条件和退火条件,p型AlInP材料获得了0.9×1018/cm3的空穴密度。外延材料制作成200μm×200μm尺寸的LED管芯,在20mA工作电流下亮度为22～24mcd。器件结果表明,用5个压应变量子阱的有源区并且采用DEZn掺杂可以制作出高亮度的670nm LED外延材料。     

表面增透结构AlGaInP LED的研究

A kind of AlGaInP light emitting diode （LED） with surface anti-reflecting structure has been introduced to solve the problems of low light efficiency and restricted luminous intensity. The new structure can be demonstrated theoretically and experimentally, and LEDs with the new structure have higher on-axis luminous intensity and larger saturation current than conventional LEDs and LEDs with ITO film only, which is caused by higher external quantum efficiency and also higher internal quantum efficiency. The new LEDs are especially suitable for working at large injected currents.     

掺Si对AlGaInP/GaInP多量子阱发光性能的影响

研究了Si掺杂对MOCVD生长的（Al0.3Ga0.7）In0.5P/Ga0.5In0.5P多量子阱发光性能的影响．样品分为两类：一类只生长了（Al0.3Ga0.7）In0.5P/Ga0.5In0.5P多量子阱结构;另一类为完整的多量子阱LED结构．对于只生长了（Al0.3Ga0.7）In0.5P/Ga0.5In0.5P多量子阱结构的样品,掺Si没有改变量子阱发光波长,但使得量子阱发光强度略有下降,发光峰半高宽明显增大．这应是掺Si使量子阱界面质量变差导致的．而在完整LED结构的情况下,掺Si却大大提高了量子阱的发光强度．相对于未掺杂多量子阱LED结构,垒层掺Si使多量子阱的发光强度提高了13倍,阱层和垒层均掺Si使多量子阱的发光强度提高了28倍,并对这一现象进行了讨论．     

台湾LED/OLED光电材料与组件技术的发展

台湾发光二极管（Light Emitting Diode,LED）的产量已达到世界第一,产值则居世界第二。将回顾台湾发光二极管产业的发展历史,并探讨产业界及研发单位在发光二极管效率提升与质量改善方面的一些重要技术发展历程。有机电激发光（OLED）组件的发展过程,除了显示器的应用发展优势之外,固态照明也是台湾近期的研发重点之一,文中将探讨磷光有机材料、组件结构技术的开发及OLED的发展趋势。     

Water bonding of 50-mm-diameter mirror substrates to AlGaInP light-emitting diode wafers

The feasibility of bonding 50-mm-diameter Si with a Au/AuBe mirror to AlGaInP light-emitting diode (LED) wafers is demonstrated. Wafer bonding over the entire wafer area is achieved while the metallic mirror still maintains high reflectivity. Using this technique, the mirror-substrate AlGaInP LEDs are fabricated across an entire 50-mm wafer. The test data show that 98% of the dice with operating voltages <2.2 V at 20 mA and 85% of the dice with luminous intensity in the 130∼140 mcd region. The wafer-bonded mirror-substrate LED lamps operating at 626 nm can emit 3 lm at 20 mA with a forward voltage of 2 V, corresponding to a luminous efficiency of 74 lm/W. Moreover, they present a peak power efficiency of 21% with 4 mW output at 10 mA (1.9 V). Essentially no degradation is observed for these LEDs after 2000 h stress at 80°C and 50 mA (55.6 A/cm²). The results indicate the mirror-substrate AlGaInP LEDs of highly reliable and efficient performance.     

GaP表面粗化对AlGaInP发光二极管光电特性的影响

采用湿法溶液粗化AlGaInP基红光LED表面GaP层 ,并在粗化后的GaP表面沉积ITO,研究了粗化时间对GaP表面形貌的影响,并利用SEM、半导 体 芯片测试机、X射线衍射仪、X射线光电子能谱对LED器件表面形貌、光电特性曲 线、界面晶向、元素特性进行表征,比较了粗化前后的LED亮度和光电特性变 化。测试结果表明:采用HIO₄、I₂、HNO₃系列粗化液在室温、粗化时间为30 S 时,有效增加了光在通过GaP面与ITO界面时的出光角度,使AlGaInP发光二极管 的发光效率提高21.4%,同时引起界面处的缺陷密度升高,费米能级 远离价带,主波长蓝移0.36 nm,正向电压上升0.04 V。