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排序方式: 共有5131条查询结果,搜索用时 15 毫秒
1.
Kedong Xia Shuoshuo Yu Yunling Li Huijuan Han Lingyao Duan Zhenyu Hou Xiao Liu 《Journal of the European Ceramic Society》2021,41(4):2375-2385
In this study, C/SiOC and C/SiO2 composites were prepared by using carbonaceous microspheres with different surface functional groups. Carbonaceous microspheres based on hydrothermal reaction of glucose contains hydroxyl group, while the surface carboxyl group increases after NaOH etching. The hydroxyl group increases the oxygen-enriched structural units of SiOC ceramics, and the C spheres are closely enwrapped in SiOC matrix after pyrolysis at 900 °C. However, the interfacial reaction of surface carboxyl with Si–OH results in the formation of cristobalite SiO2, and C spheres are not only encased inside the SiOC matrix, but also dispersed outside of SiOC ceramics. After removal of C via calcination at 500 °C for 5 h, C/SiOC and C/SiO2 composites are transformed into amorphous SiO2 and cristobalite SiO2, respectively. The thermogravimetric analysis indicates the oxidation resistance of SiOC is superior to that of C and SiO2. 相似文献
2.
This paper introduces the potential feasibility that ELID (electrolytic in-process dressing) grinding replaces superfinishing in bearing manufacturing, but ELID grinding will bring new challenges. Different regions present distinguish surface profile due to the non-uniform contact in ELID groove grinding. However, few reports explaining the non-uniform contact are available. This article explores the mechanisms of the non-uniform contact during ELID groove grinding. Experiments on the non-uniform contact between bearing raceway and grinding wheel have been carried out under different conditions. The results show that non-uniform contact exists in ELID groove grinding process and it exerts influence on the profile of the raceway surface. Non-uniform contact influences the Rsk and Rku value all the time, but it influences the Ra value occasionally. Improvement strategies of eliminating the non-uniform contact are also discussed based on the experimental study. 相似文献
3.
Textured surface is commonly used to enhance the efficiency of silicon solar cells by reducing the overall reflectance and improving the light scattering. In this study, a comparison between isotropic and anisotropic etching methods was investigated. The deep funnel shaped structures with high aspect ratio are proposed for better light trapping with low reflectance in crystalline silicon solar cells. The anisotropic metal assisted chemical etching (MACE) was used to form the funnel shaped structures with various aspect ratios. The funnel shaped structures showed an average reflectance of 14.75% while it was 15.77% for the pillar shaped structures. The average reflectance was further reduced to 9.49% using deep funnel shaped structures with an aspect ratio of 1:1.18. The deep funnel shaped structures with high aspect ratios can be employed for high performance of crystalline silicon solar cells. 相似文献
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真空微电子荧光平板显示器件的实验研究刘杰明,李志能,陈秀峰(浙江大学信息与电子工程学系)关键词:真空微电子,反应离子刻蚀一、引言近十年来,随着真空微电子学的崛起,利用微细加工技术,使真空元器件集成化和高性能化已成为可能,一种新型场致发射阵列真空荧光平... 相似文献
7.
采用HF HNO3溶液化学腐蚀 ,在硅片上制备减反射效果优良的多孔硅太阳电池减反射膜 ,借助原子力显微镜 (AFM)和X光电子谱 (XPS)对其表面形貌和成分进行观察 ,发现该膜与电化学阳极腐蚀得到的多孔硅具有相似性 ,其主要成分为非化学配比的硅的氧化物SiOx(X <2 )。采用带积分球的光度分光计 ,测得形成多孔硅减反射膜后 ,硅片表面反射率大大下降 ,,在波长 330~ 80 0nm范围反射率只有 1 5~ 2 9%。研究指出这种强减反射作用 ,与多孔硅具有合适的折射率及其多孔特性的光陷阱作用有关 相似文献
8.
合成并表征了N-十六烷基丙烯酰胺(HDA)和对叔丁基苯酚甲基丙烯酸酯(BPhMA)的共聚物p(HDA-BPhMA)s。当HDA含量较高时,共聚物可在气,液界面上形成稳定,排列紧密的单分子薄膜,并可以Y型膜的方式沉积在各种固体基片上,形成多层均匀的Langrnuir-Blodgett(LB)膜。这种LB膜被成功地应用于光刻,获得了分辨率为0.5μm的LB膜图形。以该图形为抗蚀层,可将图形进一步转移至金属薄膜上,得到分辨率较高的金属图形,在图形转移的过程中,这种LB膜显示出较高的抗蚀性,有望作为纳米抗蚀薄膜材料在亚微米刻蚀领域得到应用。 相似文献
9.
J. Hong E. S. Lambers C. R. Abernathy S. J. Pearton R. J. Shul W. S. Hobson 《Journal of Electronic Materials》1998,27(3):132-137
Dry etching of InGaP, AlInP, and AlGaP in inductively coupled plasmas (ICP) is reported as a function of plasma chemistry (BCl3 or Cl2, with additives of Ar, N2, or H2), source power, radio frequency chuck power, and pressure. Smooth anisotropic pattern transfer at peak etch rates of 1000–2000Å·min?1 is obtained at low DC self-biases (?100V dc) and pressures (2 mTorr). The etch mechanism is characterized by a trade-off between supplying sufficient active chloride species to the surface to produce a strong chemical enhancement of the etch rate, and the efficient removal of the chlorinated etch products before a thick selvedge layer is formed. Cl2 produces smooth surfaces over a wider range of conditions than does BCl3. 相似文献
10.
综述了国外离子束刻蚀和沉积系统的研究进展,指出了离子束系统在半导体技术研究,开发和生产中的重要性。 相似文献