二元光栅照明研究

采用部分相干成象理论对二元光机照明进行了较为详细的研究。分析了二元光栅照明对分辨力，焦，照明能量和照明均匀性的影响，并通过实验研究验证了二元光栅对分辨力和焦深有较大程度的提高，同时能量损失不大。     

涂胶设备背面冲洗功能的开发与研制

本文根据涂胶设备在加工制品过程中所遇到的制品背面沾污问题，提出改进措施，并根据设备的具体情况，增加了涂胶设备的背面冲洗功能。使制品在涂胶过程中，及时地对制品背面进行冲洗，从而保证了制品背面的洁净度，对提高产品质量和提高产品的成品率有非常重要的意义，同时对开发一些技术要求较高的新品也有深远的影响。     

Fabrication and characterization of a miniaturized planar voltammetric sensor array for use in an electronic tongue

A planar voltammetric sensor array for use in an electronic tongue was fabricated using a combination of microfabrication techniques. The techniques of e-beam evaporation and pulsed laser deposition were applied to prepare a device that contained all of the electrodes integrated on a silicon die (6 mm × 6 mm). The working electrodes were metals gold, platinum, iridium and rhodium. They were characterized by SEM and EDX, and by electrochemical investigation of the packaged dies with cyclic voltammetry in solutions of sulfuric acid and of ferrocene carboxylic acid in aqueous buffer solution. The robustness and reproducibility of the devices were assessed by potential cycling in acid solution.     

光刻工艺中关键流程参数分析

主要介绍了光刻工艺的基本流程,并分析了光刻工艺中的流程参数及影响光刻质量的主要因素,讨论了两种不同光刻胶在不同转速下的厚度、均匀性及留膜率,提出了光刻工艺中部分常见问题的解决方法.通过工艺优化,确定AZ3100和AZ703两种光刻胶的最佳工艺参数.     

值得重视的田口式参数设计法

本文着重论述了田口式参数设计法在半导体制造中对线宽的质量控制.通过田口式参数设计法,可以优化线宽控制对光刻过程步骤中的可控参数的条件,以便将不可控因素的影响降到最低.     

Regular microarray of Au flower-like structure formed by template-assisted electrodeposition: Influence factors and their electrochemical behavior

This paper describes a template-assisted method that combines the advantages of photolithography and electrochemical synthesis to construct a wafer-scale Au flower-like structure microarray. The detailed information about the effect of concentration of electrolyte, pattern of template substrate, applied potential, and surfactant on the formation of Au flower-like microarray is investigated. The possibility of using such a microarray as electrodes for their electrochemical properties is also tested by CV experiments.     

用5微米工艺设备加工1～2微米窄条的光刻技术

本文介绍了利用现有5μm工艺设备进行1～2μm窄条的光刻技术,着重对光刻SiO_2窄条和金属连线方面作了具体的介绍。对优化的“发射区两次错位光刻”和“多晶发射极自对准”工艺技术作了较详细的叙述。     

Photolithographic patterning of PEDOT:PSS with a silver interlayer and its application in organic light emitting diodes

A patterning scheme for poly(3,4-ethylenedioxythio-phene):poly(styrenesulfonate) (PEDOT:PSS) is reported. With a silver interlayer, the conductive PEDOT:PSS film can be patterned down to micrometer scales by traditional photolithography, and this patterning scheme can be applied on large-area flexible substrates. Through systematical investigations, the patterning processes have no obvious influence on both the bulk and surface properties of PEDOT:PSS films. Efficient organic light emitting diodes (OLEDs) are realized based on this patterned PEDOT:PSS anode, and they show comparable performance to those devices with an indium tin oxide (ITO) anode. High-resolution OLED pixel arrays are also demonstrated. Our interlayer approach here has an advantage of patterning PEDOT:PSS with high resolution and large scale, and it is also compatible with traditional photolithographic processes which substantially save the capital cost. Results indicate that the photographically patterned conductive PEDOT:PSS film becomes a promising candidate for eletrical eletrode material in organic electronic applications.     

Photolithographic patterning of organic photodetectors with a non-fluorinated photoresist system

We report on the fabrication of organic photodetectors (OPD) based on isolated islands of P3HT:PCBM. Pattern transfer to the active material was done with photolithography based on non-fluorinated solvents and the excessive organic semiconductor was removed with oxygen plasma reactive ion etching. The photoresist system used was found to be benign to the P3HT:PCBM layer as confirmed by absorption, thickness and roughness measurements. Current–voltage characteristics and external quantum efficiency (EQE) remained unchanged after the patterning process. It was demonstrated that it is possible to photolithographically pattern isolated islands with 200 μm edge length with the same dark current density (<10⁻⁵ A/cm² at −2 V bias voltage) and photocurrent density (>5 × 10⁻³ A/cm² at −2 V). Furthermore, concerning the solar cell performance, the patterned, small-area devices showed power conversion efficiency of 2.1% and fill-factor of 60%. Dark current was observed to depend on the size of the remaining semiconductor island, which was demonstrated on OPDs with diameter of 50 μm. The presented results show the feasibility of fabrication of isolated devices based on organic semiconductors patterned with non-fluorinated photolithography.