Polishing of zirconia ceramics by chemically-induced micro-nano bubbles

This study introduces micro-nano bubbles (MNBs) in the process of polishing zirconia ceramics through sodium borohydride hydrolysis to assist in polishing yttria-stabilized zirconia (YSZ). Compared with conventional silica sol, the material removal rate using this MNB-assisted technology is increased by 261.4%, and a lower surface roughness of 1.28 nm can be obtained. Raman, X-ray diffraction, and X-ray photoelectron spectroscopy are used to study the structural changes and phase stability of the YSZ during different polishing periods. The results show that MNBs are the key factor promoting the transformation from the tetragonal phase to the monoclinic phase on the surface of the YSZ during polishing. The H₂O molecules (or OH^? ions) on the surface of the YSZ are driven by the thermal kinetic energy of the micro-jets formed by the collapse of micro-bubbles, and they permeate to occupy more oxygen vacancies in the crystal lattice. Atomic force microscopy and nano-indentation tests show that the micro-protrusions on the surface of the YSZ preferentially undergo phase transformation, and their hardness decreases. This promotes abrasives to preferentially remove rough spots on the surface and achieve more efficient polishing. We believe this work adds valuable insights regarding low-temperature degradation and ultra-precise machining of YSZ ceramic materials.     

CMP系统技术与市场

概述了CMP系统技术的发展历史、发展趋势以及在IC生产中的重要性,介绍了国外CMP设备主要制造厂家的设备型号和性能及CMP设备市场分布和需求,阐述了CMP系统技术的基础研究、关键技术和国内研究概况。     

Investigation into polishing process of CVD diamond films

A new technique used for polishing chemical vapor deposition (CVD) diamond films has been investigated, by which rough polishing of the CVD diamond films can be achieved efficiently. A CVD diamond film is coated with a thin layer of electrically conductive material in advance, and then electro-discharge machining (EDM) is used to machine the coated surface. As a result, peaks on the surface of the diamond film are removed rapidly. During machining, graphitization of diamond enables the EDM process to continue. The single pulse discharge shows that the material of the coated layer evidently affects removal behavior of the CVD diamond films. Compared with the machining of ordinary metal materials, the process of EDM CVD diamond films possesses a quite different characteristic. The removal mechanism of the CVD diamond films is discussed.     

Surface characterization of 6H-SiC (0001) substrates in indentation and abrasive machining

Surface characterization of 6H-SiC (0001) substrates in indentation and abrasive machining was carried out to investigate microfracture, residual damage, and surface roughness associated with material removal and surface generation. Brittle versus plastic deformation was studied using Vickers indention and nano-indentation. To characterize the abrasive machining response, the 6H-SiC (0001) substrates were ground using diamond wheels with grit sizes of 25, 15 and 7 μm, and then polished with diamond suspensions of 3 and 0.05 μm. It is found that in indentation, there was a scale effect for brittle versus plastic deformation in 6H-SiC substrates. Also, in grinding, the scales of fracture and surface roughness of the substrates decreased with a decrease in diamond grit size. However, in polishing, a reduction in grit size of diamond suspensions gave no significant improvement in surface roughness. Furthermore, the results showed that fracture-free 6H-SiC (0001) surfaces were generated in polishing with the existence of the residual crystal defects, which were associated with the origin of defects in single crystal growth.     

不锈钢焊管抛磨新设备

PG圆管和PF方管系列抛光机的抛光质量及效率能满足生产需要。介绍了这种不锈钢圆管及方管抛光机的工作原理。着重分析了抛磨轮的选用。     

Molecular Dynamics Simulation for Ultrafine Machining

This article surveys the advances of molecular dynamics (MD) simulation in the research of ultrafine machining and related technologies. Modeling methods, including interatomic potentials and boundary conditions, are addressed. Algorithm strategies for MD simulations are discussed. By applying simulations with Tersoff potential, a case study of the material removal mechanism of the polishing based on coupling vibrations of liquid (PCVL) is presented.     

Redefining the Diamond Cutting Edge: A Technique that Complements Nano-Metric Surface Generation

Ongoing developments in broadband digital networks and optical devices require mechanical components having nano-metric surface finishes and ultra precision shapes. Such components are processed using the technology of diamond micro-machining in which diamond tools are extensively used. However, these tools are susceptible to chemical attack at high temperatures and induce severe wear, especially when cutting ferrous materials. As a result, these diamond tools need to be redefined (i.e., resharpened) on a regular basis in order to facilitate micro-cutting and to generate nano-metric surface finishes. This paper describes a new way of diamond tool edge re-sharpening and its conditions to achieve both increased accuracy and material removal rate.     

虚拟轴混联机床研抛模具自由曲面的分片规划

采用虚拟轴混联机床进行模具自由曲面的精加工,为了提高模具自由曲面的研抛精度和效率,论述自由曲面的分片抛光方法。根据计算机图形信息构造特点,将自由曲面划分为一系列曲面信息与工艺特征相同或相似的曲面片族,相似的曲面片族采用相同的工具和相近的工艺参数进行研抛加工。通过理论计算和仿真验证,此方法能够提高研抛效率。     

金属材料电解液体磨料冲刷复合抛光工艺

工件在电镀前抛光是一道费工费时的工序，我们利用电解、液体磨料冲刷复合抛光工艺，可及时去除电解过程中在工作表面产生的钝化膜，提高电解抛光质量和速度，降低劳动强度，此工艺特别适用于批量较大、表面形状较复杂的零件的抛光。     

Fundamental investigation on nano-precision surface finishing of electroless Ni–P-plated STAVAX steel using magnetic compound fluid slurry

Electroless nickel–phosphorus (Ni–P) plating used in a range of hot embossing metal molds/dies and injection metal molds/dies must be manufactured to nano-precision roughness for proper operation of the molds/dies. We therefore developed a novel polishing technique for mirror surface finishing of this kind of magnetic material using a magnetic compound fluid (MCF) slurry. The effects of the magnetic and gravitational forces acting on the carbonyl iron particles (CIPs) and abrasive particles (APs) within the MCF slurry were studied first, and the behaviors of the CIPs and APs in the presence of an external magnetic field were predicted. Then, experiments were performed to confirm the predictions by investigating the distribution of the CIPs and APs on the working surface of the MCF slurry. Finally, four MCF slurries containing CIPs and APs with different diameters were employed to finish the Ni–P-plated STAVAX steel specimen at different working gaps. The results revealed that for the magnetic workpiece, the resultant vertical force attracted CIPs towards the work surface, whereas APs were pushed away from the work surface. However, the CIPs and APs showed opposite behaviors with the non-magnetic workpiece. The percentage of APs distributed on the working surface increased and the distribution became more even as either the diameter of the CIPs or the working gap increased, whereas that of CIPs had the opposite tendency. The MCF slurry containing bigger CIPs and smaller APs should be employed and the working gap should be set at a smaller value in order to perform mirror surface finishing of a magnetic Ni–P-plated surface. Under the experimental conditions in this work, the Ni–P-plated surface quality improved significantly, and a mirror surface roughness (Ra) of 4 nm was successfully achieved without leaving scratches or particle adhesion when using an MCF slurry containing CIPs 7 μm in diameter and APs 1 μm in diameter, showing that MCF slurries containing commercial CIPs are applicable to the nano-precision finishing of magnetic materials.