源气体流量比对F-DLC薄膜结构的影响

以高纯石墨作靶，CHF3/Ar作源气体采用反应磁控溅射法制备出了氟化类金刚石（F-DLC）薄膜。拉曼光谱表明，CHF3相对流量的增加会引起薄膜的D峰与G峰强度之比I（D）/I（G）减小，晶粒增大，芳香环结构出例下降。红外吸收光谱分析证实了这些推论，指出这是由于薄膜中氟含量上升的结果。     

无氢类金刚石碳膜的研究进展

介绍了无氢类金刚石碳膜的制备方法 ,它们的机械、光学、电学性能 ,将无氢与含氢的类金刚石碳膜进行了简单比较 ,总结及探讨了它们的应用     

Adhesion studies of diamond-like carbon films deposited on Ti6Al4V substrate with a silicon interlayer

Diamond-like carbon (DLC) films have proven quite advantageous in many tribological applications due to their low friction coefficient, their extreme hardness, and more recently their high adherence on different substrate materials. However, for many applications, DLC films as thick as 2 μm are required, which cause high residual stress. In order to overcome this problem, this study observed the behavior of different thicknesses of silicon interlayer between DLC films and Ti6Al4V substrates. The study also analyzed the relation of growth parameters to the mechanical properties of DLC films. Silicon and DLC films were grown by using a rf-PECVD at 13.56 MHz with silane and methane atmospheres, respectively. The contribution of an interlayer thickness to the adhesion between the DLC films and Ti6Al4V substrate was evaluated by using a micro-scratch technique. The hardness and friction coefficient were evaluated by using microindentation and lateral force microscopy (LFM), respectively. Raman scattering spectroscopy was used to characterize the film quality. A correlation was found between the intrinsic stress and adhesion of DLC film and the parameters of the silicon interlayer growth. The addition of a silicon interlayer successfully reduced intrinsic stress of the films, even as measured by using a perfilometry technique.     

真空阴极弧离子镀类金刚石碳（DLC）膜的碳弧稳定性研究

选用氩气、氩气加氢气、氩气加乙炔等气体作为介质，石墨作为靶材进行真空阴极弧离子镀来制备类金刚石碳膜。石墨电弧有其独特的电弧特性曲线，不同气体介质对碳弧特性的影响不同，磁场的大小对电弧的稳定性有很大作用，碳弧下基片偏流随电弧电压的增加而减小，试验得到表面光滑的类金刚石碳（DLC）膜，对膜的表面进行了SEM分析。     

The Friction and Wear Properties of CrN, Graphit-iC and Dymon-iC Coatings in Air and under Oil-lubrication.

NITRIDE COATINGS have always been the popularchoice for increasing the wear lifetime for industrialcomponents.TiN is the most widely accepted butrecently CrN has been gaining more interest due itsthermal stability and good performance in corrosiveenvironments.Knowledge of the tribologicalperformance of CrN coatings in dry and lubricatedconditions is still quite limited[1,2].Many authorshave studied the properties of diamond like carbon(DLC)films and how they perform in dry conditions[…     

Nitrogen incorporated diamond-like carbon films by microwave surface wave plasma CVD

Nitrogen incorporated diamond like carbon films have been deposited by microwave surface wave plasma chemical vapor deposition (MW-SWP-CVD), using methane (CH₄) as the source of carbon and with different nitrogen flow rates (N₂ / CH₄ flow ratios between 0 and 3). The influence of the nitrogen incorporation on the optical, structural properties and surface morphology of the carbon films were investigated using different spectroscopic techniques. The nitrogen has been incorporated into DLC:N films which was confirmed by the X-ray photoelectron spectroscopy (XPS) measurement. Moreover, the nitrogen incorporation was accompanied by a variation in the optical gap, which was attributed to the removal or creation of band tail states.     

Diamond-like carbon thin films by microwave surface-wave plasma CVD aimed for the application of photovoltaic solar cells

The nitrogen doped diamond-like carbon (DLC) thin films were deposited on quartz and silicon substrates by a newly developed microwave surface-wave plasma chemical vapor deposition, aiming the application of the films for photovoltaic solar cells. For film deposition, we used argon as carrier gas, nitrogen as dopant and hydrocarbon source gases, such as camphor (C₁₀H₁₆O) dissolved with ethyl alcohol (C₂H₅OH), methane (CH₄), ethylene (C₂H₄) and acetylene (C₂H₂). The optical and electrical properties of the films were studied using X-ray photoelectron spectroscopy, Nanopics 2100/NPX200 surface profiler, UV/VIS/NIR spectroscopy, atomic force microscope, electrical conductivity and solar simulator measurements. The optical band gap of the films has been lowered from 3.1 to 2.4 eV by nitrogen doping, and from 2.65 to 1.9 eV by experimenting with different hydrocarbon source gases. The nitrogen doped (flow rate: 5 sccm; atomic fraction: 5.16%) film shows semiconducting properties in dark (i.e. 8.1 × 10^{− 4} Ω^{− 1} cm^{− 1}) and under the light illumination (i.e. 9.9 × 10^{− 4} Ω^{− 1} cm^{− 1}). The surface morphology of the both undoped and nitrogen doped films are found to be very smooth (RMS roughness ≤ 0.5 nm). The preliminary investigation on photovoltaic properties of DLC (nitrogen doped)/p-Si structure show that open-circuit voltage of 223 mV and short-circuit current density of 8.3 × 10^{− 3} mA/cm². The power conversion efficiency and fill factor of this structure were found to be 3.6 × 10^{− 4}% and 17.9%, respectively. The use of DLC in photovoltaic solar cells is still in its infancy due to the complicated microstructure of carbon bondings, high defect density, low photoconductivity and difficulties in controlling conduction type. Our research work is in progress to realize cheap, reasonably high efficiency and environmental friendly DLC-based photovoltaic solar cells in the future.     

Sliding wear of non-hydrogenated diamond-like carbon coatings against magnesium

Magnesium alloys are of increasing interest to the automobile industry for their potential in reducing vehicle weight, and in turn, improving fuel economy and lowering emissions. It follows that improving the magnesium manufacturing processes will promote greater use of magnesium alloys in automobiles. In recent years, diamond-like carbon (DLC) coatings have attracted attention for their low coefficient of friction (COF) and wear rates. The implementation of DLC coatings on tool and die surfaces may help increase the efficiency of magnesium component manufacturing processes (such as cutting and sheet forming) and also improve the surface quality of the finished products.In this study, the dry sliding wear behaviour of magnetron sputtered non-hydrogenated DLC coatings against Mg (> 99.9 wt.%) was investigated using a vacuum pin-on-disc tribometer. Tests were performed in ambient air (28% RH) and in argon, under a constant load of 5 N and at a sliding speed of 0.12 m/s. In argon, the non-hydrogenated DLC coatings showed a very low COF of 0.05 after an initial running-in period. Carbonaceous material transfer from the non-hydrogenated DLC to the contact surface of the Mg pin was observed in argon. Changing the test atmosphere from argon to ambient air increased the COF to 0.40, which was accompanied by the formation of oxidized Mg debris and an increased wear rate. The friction and wear mechanisms of non-hydrogenated DLC coatings against Mg are proposed to rationalize experimental observations.     

偏压类型对磁过滤等离子体制备优质类金刚石膜的影响

采用自行研制的磁过滤等离子体装置在单晶Si基底上制备了优质类金刚石(DLC)薄膜.运用红外光谱(IR)、扫描电镜(SEM),原子力显微镜(AFM)和纳米压痕仪对样品进行了表征和分析,着重研究了衬底偏压类型对制备薄膜的影响.结果表明:在无偏压或周期性负偏压下制备的DLC薄膜的sp3含量比连续负偏压下制备的薄膜的sp3含量要高;同时在周期性偏压下制备的薄膜表面较光滑,其表面粗糙度仅为0.1 nm,sp3含量达到66.8%,相应的纳米硬度也较高(达到80GPa).同时对相应的成膜机理进行了讨论.     

射频输入功率对DLC∶F∶Si薄膜结构和附着特性的调制机理

以SiC陶瓷靶为靶材,Ar和CHF_3为源气体,采用反应磁控溅射法在双面抛光的316L不锈钢基片上制备出了系列Si和F共掺杂的DLC∶F∶Si薄膜。研究了射频输入功率对薄膜的附着力、硬度和表面接触角的影响。结果表明,选取适当的输入功率(180W左右)可以制备出附着力达11N的DLC∶F∶Si薄膜。通过拉曼和红外光谱分析以及样品粗糙度分析,作者提出了输入功率对DLC∶F∶Si薄膜结构和特性调制的机理,即输入功率直接影响SiC靶的溅射产额、空间Ar~+的能量以及CHF_3的分解程度,继而影响空间Si、C、-CF、-CF_2,特别是F~*等基团的能量和浓度,调制薄膜中F含量以及Si-C键含量和C网络的关联度。Si-C、C=C键的增加有助于薄膜附着力的明显改善,F含量的减少则会导致薄膜的疏水性能有所下降。