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排序方式: 共有94条查询结果,搜索用时 296 毫秒
1.
Koji Yamada Noboru Miura Chihiro Hamaguchi Norihiko Kamata 《Solid-state electronics》1989,32(12):1113-1117
Hot carrier magnetophonon resonances of n-type Si, short channel InP and p-type InSb were investigated in pulsed high magnetic fields up to 40 T. Using a recently developed high resolution technique in pulsed high fields, many new features of the hot carrier-phonon interactions in high magnetic fields were found. 相似文献
2.
预压缩单晶镍基合金的组织结构及在拉伸蠕变期间的粗化特征 总被引:1,自引:1,他引:1
对[001]取向单晶镍基合金进行压应力处理,获P-型筏状结构后,对其进行拉伸蠕变性能测试及SEM形貌观察,研究了P-型筏状结构的粗化特征及影响因素。结果表明:由于应力场的差别,样品不同位置筏状γ'相粗化程度及特征不同,近断口处筏状γ'相扭曲且粗化程度加剧,随离断口距离增加,γ'相粗化程度减弱。有限元分析认为:外加载荷改变了水平和垂直γ基体通道中的错配应力分布,并使立方γ'相不同界面晶格发生挤压或扩张应变,这可以促进元素的互扩散和γ'相的定向生长,是形成P-型筏状组织的主要原因。在高温及拉应力作用下,P-型γ'相端部沿垂直于应力轴方向优先生长和相互横向连接,并进一步形成折叠的层状组织。 相似文献
3.
P型CuAlO2半导体陶瓷的烧结研究 总被引:1,自引:0,他引:1
性能良好的陶瓷靶材是溅射法制备薄膜的先决条件.本文以纳米级Al2O3粉体和微米级Cu2O粉体为原料通过烧结的方法制备了P型透明导电氧化物陶瓷CuAlO2.以X射线衍射和SEM分析的方法研究了烧结温度对反应进行的影响,并在合适的温度区间里得到了具有较好P型半导体性能的陶瓷,其迁移率达到27 cm2·V-1·s-1.以它作为靶材通过真空溅射得到了迁移率为2.1 cm2·V-1·s-1的P型透明半导体薄膜. 相似文献
4.
Robert Schmid 《Automatica》2007,43(9):1666-1669
The papers by Xu and Tan [Robust optimal design and convergence properties analysis of iterative learning control approaches, Automatica 38 (2002) 1867-1880], and Xu and Tan [On the P-type and Newton-type ILC schemes for dynamic systems with non-affine input factors, Automatica 38 (2002) 1237-1242], give a convergence analysis for several iterative learning control approaches. Unfortunately, these papers contains several mathematical errors that render the proofs of the claimed results invalid. As there are no obvious ways to correct these errors, the results presented in these papers are questionable. 相似文献
5.
Transparent p-n heterojunction diodes have been fabricated by p-type copper aluminum oxide (p-CuAlO2 + x) and n-type aluminum doped zinc oxide (n-Zn1 − xAlxO) thin films on glass substrates. The n-layers are deposited by sol-gel-dip-coating process from zinc acetate dihydrate (Zn(CH3COO)2·2H2O) and aluminum nitrate (Al(NO3)3·9H2O). Al concentration in the nominal solution is taken as 1.62 at %. P-layers are deposited onto the ZnO:Al-coated glass substrates by direct current sputtering process from a prefabricated CuAlO2 sintered target. The sputtering is performed in oxygen-diluted argon atmosphere with an elevated substrate temperature. Post-deposition oxygen annealing induces excess oxygen within the p-CuAlO2 + x films, which in turn enhances p-type conductivity of the layers. The device characterization shows rectifying current-voltage characteristics, confirming the proper formation of the p-n junction. The turn-on voltage is obtained around 0.8 V, with a forward-to-reverse current ratio around 30 at ± 4 V. The diode structure has a total thickness of 1.1 μm and the optical transmission spectra of the diode show almost 60% transmittance in the visible region, indicating its potential application in ‘invisible electronics’. Also the cost-effective procedures enable the large-scale production of these transparent diodes for diverse device applications. 相似文献
6.
C.C. WuD.S. Wuu P.R. LinT.N. Chen R.H. HorngS.L. Ou Y.L. TuC.C. Wei Z.C. Feng 《Thin solid films》2011,519(6):1966-1970
Wurtzite-structure MgxZn1 − xO materials with five different compositions of x from 0 to 0.14 were grown on sapphire substrates by metalorganic chemical vapor deposition. It was found that increasing Mg content in the MgxZn1 − xO not only increased the band gap energy of the film but was also beneficial to the epitaxial growth of p-type MgxZn1 − xO without using any doping sources. In addition, the combined ultraviolet photoluminescence (PL) and Raman scattering spectra were measured with PL-Raman signals obtained together, showing a blue-shift of PL band and variation of resonant Raman multi-order longitudinal optical phonon modes with an increase of Mg content. 相似文献
7.
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9.
研究一类高阶分布参数系统的迭代学习控制问题,该类系统由退化高阶抛物型偏微分方程构成.根据系统所满足的性质,基于P型学习算法构建得到迭代学习控制器.利用压缩映射原理,证明该算法能使得系统的输出跟踪误差于L~2空间内沿迭代轴方向收敛于零.最后,仿真算例验证了算法的有效性. 相似文献
10.
Lingxiang Chen Zhizhen Ye Shisheng Lin Haiping He Yujia Zeng Binghui Zhao Liping Zhu 《Materials Letters》2008,62(17-18):2554-2556
Monodoping Li as acceptor, p-type ZnMgO thin films have been realized via dc reactive magnetron sputtering followed by a thermal anneal process. The conductivity of Li-doped films are transformed from highly resistant to p-type via anneal. This phenomenon may be associated with eliminating of LiZn–Lii complexes and Lii. The optimized p-type Zn0.96Mg0.04O:Li thin film possesses a resistivity of 72.3Ω cm and a carrier concentration of 1.49 × 1017cm− 3, while the electrical properties of Zn0.84Mg0.16O:Li thin film degrade in comparison to Zn0.96Mg0.04O:Li thin film. Moreover, the absorption spectra confirm Mg can be a good candidate for band gap engineering in p-type ZnO film. 相似文献