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Films of cubic boron nitride were deposited on to Mo, Si, WC–Co substrates heated up to 600–800 °C in a three-electrode d.c. device with a discharge localization by magnetic field. During SiB6 and AlB12 sputtering in Ar–N2 and Ar–N2–H2 atmospheres, the low-frequency (LF) substrate bias ranged from 50 to 500 V (20 kHz), and the total pressure was 1.5 mTorr. The effects of gas atmosphere, LF substrate bias and ionization energy on structure formation and composition of the films being deposited have been studied. The film structure and composition were examined using IR spectroscopy and X-ray diffraction analysis. The deposited films have polycrystal structures with a hexagonal, wurtzitic or cubic symmetry. The predominated quantity of cubic phase is observed in films deposited using SiB6 in Ar–N2 atmosphere at a LF substrate bias of 500 V. By introducing hydrogen into the gas atmosphere at a ratio of three parts of N2 to seven parts of H2, a wurtzitic phase forms in the film. The cubic BN phase is observed in films obtained using AlB12 if the LF substrate bias is between 200 and 300 V. The Vickers microhardness of the films produced reaches 30.0–35.0 GPa. 相似文献
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多功能过程校验仪越来越多地应用于现场校验,为现场检修维护人员提供了方便。由于在检定过程中的一些认识上的问题,计量人员在检定过程中往往不能选择合适的标准仪器,本文通过对多功能过程校验仪检定过程中出现的问题进行分析,提出了检定过程中标准仪器选择和使用的一些看法,并对热电偶输出与测量功能的检定提出了一些建议。 相似文献
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