密闭腔内毫秒级传热中内壁温度的软测量

密闭腔工况在工业、国防上有着广泛的应用和更广泛的发展前景，实现其内壁温度的测量具有重要的意义。在分析机理的基础上，采用软测量的方法，对密闭腔内毫秒级传热中内壁温度的测量进行了研究，获得了温度软测量的模型及相应的解法。实例表明：采用软测量方法，选择变化缓慢的温度为二次变量，并利用给出的软测量模型与解法，可以实现密闭腔内毫秒级传热中内壁温度的测量。     

Plasma deposition of thin film silicon: kinetics monitored by optical emission spectroscopy

The optical emission spectroscopy technique is used to characterise the temporal behaviour of a pure silane plasma in the first 90 s after ignition of a static closed-chamber very high frequency glow discharge. Special interest is drawn to the formation of microcrystalline silicon (μc-Si:H) in absence of any hydrogen feedstock gas dilution. The kinetics of the emission lines of SiH^* and H_α is reported. The deposited films are characterised by photothermal deflection spectroscopy, Fourier transform infra red (FT-IR) absorption and show typical microcrystalline fingerprints; for the first time, such material is used as absorber layer in n–i–p type solar cell devices.