基准平面垂直断面法在爆破漏斗试验中的应用

系统阐述了基准平面垂直断面法在爆破漏斗试验中测量爆破漏斗体积的基本原理,并将隧道激光断面仪应用于金厂河矿1 750 m水平15^#采场底部切割巷道爆破漏斗试验爆破漏斗体积测量中。通过与传统体重法等计算法所得漏斗体积分析比较,结果表明基于隧道激光断面仪与3D Mine软件分析的基准平面垂直断面法实用性强、操作方便、结果直观可靠,达到试验预期目的。     

平面桁架构建的定日镜面形支撑结构优化及实验

针对反射面成型的复杂影响因素，提出平面桁架构建的定日镜面形支撑结构优化技术路线. 利用模拟仿真、数值计算和优化算法等方法，解析20 m²定日镜面形定义技术路线的4个组成环节：面形规格及宽高比、上弦杆的截面矩、平面桁架组间距的最优值、机加工中工艺控制要点的量化. 试制小型定日镜进行实验，分析光斑形状和能流密度分布特性，并与理想球面形光斑比较，两者的拟合优度大于0.98. 实验结果表明，当反射镜宽高比取1.2，上弦杆截面矩取40 000 mm⁴，桁架组间距取950 mm，上弦杆和斜杆的开孔公差小于0.9 mm时，反射面形的质量提升. 研究从原理和实践上证明了该优化技术路线的可行性.     

铝薄膜CMP影响因素分析

提出了在碱性抛光液中铝薄膜化学机械抛光的机理模型,对抛光液的pH值、磨料、氧化剂浓度对过程参数的影响做了一些试验分析。试验结果表面粗糙度的铝薄膜所需的最优化CMP过程参数:硅溶胶粒径为15～20nm,pH值为10.8～11.2,氧化剂浓度为2.5%～3%。     

自动交换光网络控制平面功能结构的探讨

文章主要讨论了自动交换光网络(ASON)控制平面的两种不同结构：控制平面在网元外部的结构和控制平面部分集成在网元内部的结构，并对这两种结构进行了比较．     

天然气吸附储存脱附过程的动态模拟

通过热动力学计算,认识了脱附过程当中储罐内温度剖面分布的典型特征:储罐轴心处的温度下降幅度最大。分析了脱附过程当中储罐壁的热交换、吸附剂的导热系数以及储罐内的初始压力对储罐内的温度剖面的影响。结论是加强储罐外壁的热交换、增大吸附剂的导热系数皆能改善吸附储罐内的温度剖面。     

智能光网络控制平面技术

光网络的智能化是下一代光网络发展的主要趋势,在对智能光网络发展背景进行分析的基础上,对光网络控制平面技术进行了讨论,重点分析了光网络控制平面的功能模型、主要功能、应用协议和控制平面的可靠性等问题。     

Characterization and optimization of copper chemical mechanical planarization

The feature scale planarization of the copper chemical mechanical planarization (CMP) process has been characterized for two copper processes using Hitachi 430-TU/Hitachi T605 and Cabot 5001/Arch Cu10K consumables. The first process is an example of an abrasive-free polish with a high-selectivity barrier slurry, while the second is an example of a conventional abrasive slurry with a low-selectivity barrier slurry. Copper fill planarization has been characterized for structures with conformal deposition as well as with bumps resulting from bottom-up fill. Dishing and erosion were characterized for several structures after clearing. The abrasive-free polish resulted in low sensitivity to overpolish and low saturation levels for dishing and erosion. Consequently, this demonstrated superior performance when compared to the International Technology Roadmap for Semiconductors (ITRS) 2000 roadmap targets for planarization. While the conventional slurry could achieve the 0.13-μm technology node requirements, the abrasive-free polish met the planarization requirements beyond the 0.10-μm technology node.     

激光抛光技术的发展与展望

介绍激光抛光技术的发展历史,阐明激光抛光的应用现状及未来的发展前景,论述了激光抛光的工艺特点和作用机理,将激光抛光技术与其它抛光技术进行了全面的对比,指出激光抛光的优势及其存在的问题。     

局部设有钢筋砼电梯井墙的设计探讨

本文就局部设有钢筋砼电梯井的工程计算及理论分析，阐明分析了少墙的框剪结构的设计及注意问题。     

Constitutive modelling and numerical simulation of multivariant phase transformation in superelastic shape‐memory alloys

This work concerns the micromechanical constitutive modelling, algorithmic implementation and numerical simulation of polycrystalline superelastic alloys under multiaxial loading. The model is formulated in finite deformations and incorporates the effect of texture. The numerical implementation is based on the constrained minimization of the Helmholtz free energy with dissipation. Simulations are conducted for thin tubes of Nitinol under tension–torsion, as well as for a simplified model of a biomedical stent. Copyright © 2004 John Wiley & Sons, Ltd.