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A lubrication-flow model for a free film in a corner is presented. The model, written in the hyperbolic coordinate system
ξ = x
2 −y
2, η = 2xy, applies to films that are thin in the η-direction. The lubrication approximation yields two coupled evolution equations
for the film thickness and the velocity field which, to lowest order, describes plug flow in the hyperbolic coordinates. A
free film in a corner evolving under surface tension and gravity is investigated. The rate of thinning of a free film is compared
to that of a film evolving over a solid substrate. Viscous shear and normal stresses are both captured in the model and are
computed for the entire flow domain. It is shown that normal stress dominates over shear stress in the far field, while shear
stress dominates close to the corner.
This revised version was published online in October 2005 with corrected page numbers. 相似文献
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Corner detection is a low-level feature detection operator that is of great use in image processing applications, for example, optical flow and structure from motion by image correspondence. The detection of corners is a computationally intensive operation. Past implementations of corner detection techniques have been restricted to software. In this paper we propose an efficient very large-scale integration (VLSI) architecture for detection of corners in images. The corner detection technique is based on the half-edge concept and the first directional derivative of Gaussian. Apart from the location of the corner points, the algorithm also computes the corner orientation and the corner angle and outputs the edge map of the image. The symmetrical properties of the masks are utilized to reduce the number of convolutions effectively, from eight to two. Therefore, the number of multiplications required per pixel is reduced from 1800 to 392. Thus, the proposed architecture yields a speed-up factor of 4.6 over conventional convolution architectures. The architecture uses the principles of pipelining and parallelism and can be implemented in VLSI. 相似文献
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介绍了现在制造业中面临的问题,通过对问题的分析,提出了发展先进制造前沿技术的见解和在我国发展先进制造技术的途径,同时展望了先进制造技术的发展前景。 相似文献
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Higher resolution can be achieved in lithography by decreasing the wavelength of the exposure source. However, resist material
and their processing are also important when we move to a shorter wavelength lithography technology. This paper reviews the
recent development and challenges of deep-UV photoresists and their processing technology. 相似文献
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