Sensitometric characteristics of an all‐solid‐state photoelectrochromic pixel for an electrochromic light‐addressable display

Abstract— An all solid‐state photoelectrochromic element (PECE) was developed on the basis of electrochromic layers of WO₃ and polyaniline with a layer of polymer electrolyte placed on a base of polyamidosulfoacid, in which a thin‐film CdS_xSe_1?x photoresistor was used as an electronic key. The dependence of the sensitometric characteristics of the PECE on the applied voltage was studied.     

钼酸盐阻燃抑烟剂研发现状

简要地叙述了钼酸盐类阻燃抑烟剂 ,如八钼酸铵、钼酸锌、钼酸钙、钼酸钴和三氧化钼等阻燃抑烟剂的研发现状     

Ni-Mo-O催化剂中协同作用对丙烷氧化脱氢的影响

在 Ni-Mo-O体系中 ,加入 Mo O3 能极大地提高丙烷氧化脱氢制丙烯的反应活性。选用固混法、沉淀法、柠檬酸法制备了 Mo O3 过量 1 5 % (摩尔分数 )的α -Ni Mo O4催化剂 ,其中用沉淀法制得催化剂在 5 0 0℃ ,V( C3 H8) /V ( O2 ) /V ( N2 ) =1 0 /1 0 /5 0 ,反应气流量为 70 m L/min的条件下丙烷转化率可达 38.7% ,丙烯选择性达 70 .1 4 %。经 XRD,XPS,TPR表征说明 ,在含有过量 Mo O3 的催化剂中 ,α -Ni Mo O4与 Mo O3 两种晶体之间可产生微小的相互吸引 ;从而发挥协同作用 ,是提高催化剂活性     

SO_3磺化法合成PNTS新工艺的研究

本文采用正交设计及方差分析法,确定了 SO_3磺化法合成 PNTS 新工艺的最佳工艺条件;并从技术及经济方面将新工艺同国内现有的生产老工艺进行了分析对比。     

Reactively sputtered MoO3 films for ammonia sensing

We report the gas-sensing properties of ion-beam sputter deposited MoO₃ thin-films. The change in the DC conductivity was measured in dry N₂ with 10% O₂ in the presence of up to 490 ppm of NH₃, NO, NO₂, C₃H₆, CO and H₂. At ∼440 °C the film was found to be very sensitive to NH₃, with 490 ppm increasing the conductivity by approximately a factor of 70. This was approximately 17 times greater than the response to the other gases. The NH₃ response was strongly affected by the accompanying levels of O₂, NO₂ and H₂O. For example, changing the accompanying O₂ levels from 1% to 20% decreased the NH₃ response by approximately a factor of 20. Similarly, the presence of 100 ppm NO₂ (in 10% O₂) decreased the NH₃ response by approximately a factor of three, and 1% water vapor decreased it by more than a factor of two. The NH₃ response, however, was relatively unaffected by 100 ppm of accompanying NO, C₃H₆, CO or H₂. XPS measurements show that the increased conductivity in the presence of NH₃ was also accompanied by a partial reduction of the surface MoO₃. We observed an increase in the resistance of the films after extended time at elevated temperatures.     

Kinetic study of the reaction between molybdenum trioxide and gaseous carbon tetrachloride

The kinetics of the chlorination reaction of molybdenum trioxide with gaseous carbon tetrachloride has been studied at temperatures between 713 and 753 K. The effects of temperature, reaction time, residence time and gaseous reactant concentration on conversion were studied throughout the reaction. In all cases, there was an increase in conversion when the above operating variables were increased. The kinetic model proposed is consistent with and correlates the experimental data. In the range studied for the different variables, the step that controls the rate of reaction is the surface chemical reaction. Values of the rate constant and the activation energy were estimated.     

Studies on spray pyrolyzed molybdenum trioxide thin films

Semiconducting molybdenum trioxide thin films have been prepared by employing simple and inexpensive spray pyrolysis technique. Films are found to be polycrystalline in nature with hexagonal phase. Optical band gap energy (direct) and room temperature electrical resistivity are of the order of 2·9 eV and 10⁸ ohm-cm, respectively. These films exhibit cathodic electrochromism.     

Infrared absorption in Li-intercalated tungsten oxide

Thin films of amorphous and polycrystalline tungsten oxide were produced by reactive dc magnetron sputtering and nanocrystalline films were deposited by advanced gas evaporation. The films were submitted to electrochemical intercalation of Li ions before infrared reflectance measurements were carried out. For crystalline films, the reflectance in the wavelength region 10–30 μm increases upon intercalation, indicating an increasing free-electron contribution. On the other hand, all the films display an increased absorption at wavelengths less than 10 μm when intercalated. The thermal emittance could be varied from about 0.5 to 0.7–0.75 by intercalation in films with thicknesses in excess of 1 μm. Both absorption and interference contribute to the emittance contrast.     

三氧化硫磺化甲苯反应的工艺条件研究

采用稀释SO3磺化甲苯工艺，研究了磺化温度．SO3配气比，原料中水含量和二甲苯砜抑制剂等工艺因素对反应转化率，产物中甲苯磺酸异构体含量及副产物二甲苯砜含量的影响。在10℃．SO3浓度为6％（volume）的操作条件下，二甲苯砜为抑制剂，甲苯转化率达到35％（mass）．反应产物中没有新增二甲苯砜，对甲苯磺酸含量达到88．24％．间甲苯磺酸含量降低到0．97％。     

甲苯三氧化硫磺化反应抑制副产物二甲苯砜的研究

对SO3磺化甲苯反应的副产物二甲苯砜成因及反应历程进行了分析,通过实验比较了醋酸与二甲苯砜的抑制效果,提出用磺化副产物二甲苯砜自身抑制的新方法.考察了二甲苯砜力入量和甲苯转化率对抑制副反应的影响.反应温度:10℃,三氧化硫:6%,甲苯转化率为35%时,外加甲苯质量3.3%的二甲苯砜就能控制二甲苯砜含量不增加,且甲苯磺酸异构体的对位含量由84%上升到89%,间位含量由2.5%下降到1%.