UV-LED光固化体系光引发剂的新进展

本文综述了可用于UV-LED光固化体系光引发剂的研究进展，包括传统光引发剂及其衍生物（硫杂蒽酮类、二苯甲酮类和酰基膦氧化物）、新型基团的光引发剂（咔唑基、萘酰亚胺基、吩嗪基、苯丙二茂基、咪唑基和三嗪基）以及高分子光引发剂。传统光引发剂的改性和大分子光引发剂的合成，可以提高引发剂的稳定性。新型光引发剂的吸收波长与UV-LED光固化的发射波长匹配性较好，但该类光引发剂常需要加入助剂。此外，描述了氧阻聚对光固化体系的影响，指出了目前UV-LED光引发剂存在的不足，并展望了其发展应用前景。。     

基于标志点注册及探测球的光源追踪算法

增强现实系统中,解决虚拟物体表面光照情况与真实环境匹配问题关键的一步是进行光源追踪。基于标志点注册及具有漫反射特性的探测球提出一种光源追踪算法。该算法仅对一幅被单一光源照射的标志立方体和探测球图像进行分析,利用图中标志点确定探测球相对照相机的位置、姿态关系,利用探测球表面的亮度信息推算光源向量。该探测球图像要进行一系列图像处理程序,其中等亮度线的提取及拟合是关键步骤。实验结果表明,本文算法能够达到预期效果,较好地实现了光源追踪,适用于各种位置的单一光源照射情况及基于标志点注册的增强现实系统。     

Photometric stereo using LCD displays

This paper considers the problem of shape-from-shading using nearby extended light sources. The paper reviews a number of methods that employ nearby illuminants, and describes a new technique that assumes a rectangular planar nearby distributed uniform isotropic illuminant. It is shown that such a light source illuminating a small Lambertian surface patch is equivalent to a single isotropic point light source at infinity, in the absence of shadowing. A closed-form solution is given for the equivalent point light source direction in terms of the illuminant corner locations. Equivalent point light sources can be obtained for distinct illuminant patterns allowing standard photometric stereo algorithms to be used. An extension is given to the case of a rectangular planar illuminant with arbitrary radiance distribution. Experimental results are shown demonstrating the application of the theory to photometric stereo using illumination from a LCD computer monitor. Details on the photometric calibration of the illumination source and image acquisition device are provided.     

建筑景观照明设计中光源光谱与环境作用的关系

景观照明设计师一般从实践中理解所设计环境要素,而相对缺乏对光源光谱以及景观形成的深刻理解,从而导致不能预期景观照明最终带来的效果,目前景观照明中存在照明情境不符、过度照明、光污染等问题。通过从光谱理论的角度探讨光源色与物体色的关系,以及光谱与物体反射的作用理论,并以某一物体色样作为参考,探讨了传统光源、LED光源以及各种单色光谱对于色样照射产生的效果,分析了光源光谱与环境作用关系,得到景观照明效果的一般性结论。由此可以从理论上对建筑照明设计中照明效果进行预期以及选用合适光谱的光源。基于光谱理论的推导、计算,使得景观照明效果能够完全定量化。     

Estimation of illuminant chromaticity based on highlight detection for face images with varying illumination

Illuminant chromaticity estimation is required in the fields of the tracking and recognition of human faces, compensation and detection of skin color, image reproduction, and color constancy. This article proposes a simple and effective method to estimate the illuminant chromaticity using highlights from the face region. We first select the candidate points through the detection of highlights around the leftmost pixel of the rg chromaticity space from the facial images under various illuminant conditions and then estimate the illuminant chromaticity by averaging the chromaticities of the candidate points. To enhance the illuminant chromaticity estimation accuracy, we propose a more elaborate estimation method, which effectively readjusts the candidate points of the highlight regions according to the conditions derived from two ethnic and three illuminant groups. The experiment results show that our proposed method reliably estimates the illuminant chromaticity under various color temperatures and illuminant directions. © 2012 Wiley Periodicals, Inc. Col Res Appl, 39, 188–199, 2014     

A UV-LEDs based photomicroreactor for mechanistic insights and kinetic studies in the norbornadiene photoisomerization

In this work, we report a simple and inexpensive UV-LEDs based photomicroreactor assembly constructed by commercially available components. The photoisomerization of norbornadiene to quadricyclane was selected to validate this novel photomicroreactor design. Mass transport limitation was eliminated and indicated by dimensionless numbers Fo and Da _II, and photons loss was evaluated considering the absorption and reflection of the microreactor walls. The solvents, photosensitizers, and light sources selections were optimized for achieving better photochemical performance and mechanistic insights. The detailed comparison between the high-pressure mercury arc lamp and the UV-LEDs strip revealed great potential of UV-LEDs as appealing light source for photochemical transformations. Moreover, the reaction mechanism was thoroughly discussed and illustrated by the Jablonski diagram indicating electronic states transitions. According to possible intermediate steps, a kinetic model was proposed with the reaction rate constant being correlated with the photon flux, which is valuable for process optimization and further understanding reaction mechanisms.     

基于光照无关图的阴影去除方法

为了在检测目标时排除阴影的干扰,首先论述了光照无关图的原理及其重要性质,然后在此基础上提出了一种基于光照无关图的阴影去除方法。该方法根据光学成像原理通过对图像进行变换来得到一幅与光照无关的灰度图,以达到去除阴影的目的。同时针对该方法需事先测定摄像机的光照无关角的不便之处,还提出了基于直方图统计的摄像机光照无关角判定法则。通过对大量不同场景下视频监控图像的实际测试结果表明,基于光照无关图的阴影去除方法以及基于直方图统计的光照无关角判定方法,可以有效去除目标阴影,并可准确分割目标。     

Development and Study of Applications Combining Nanopowder Imprint Lithography and Array-Type UV-Curing Technology for Micro-Lens Molding

This study developed creative imprinting technology, combining nano-imprint lithography and array-type UV-curing technology. It used nanopowders as the method to transmit imprint force, and integrated technical features, such as soft lithography, light-curing resistant and gas-assisted imprint technology, in order to study the development of technological processes of micro-lens array manufacturing, and mature the application and technology of nano-imprinting. According to research results, SUS 304 stainless steel sheet with a micro-hole array could be smoothly fabricated into an original micro-lens array mold upon gas-assisted micro-hot embossing. At the same time, a micro-lens array structure with a complementary external form could be precisely remolded and reproduced by PDMS. Complete molding of micro-lens could be effectively achieved by combining imprints of gas-assisted lithography developed in this study, and even UV-NIL. The effective imprinting area and reproducibility of transfer printing could be greatly improved when a micro-lens contacts perfectly with a substrate surface. Moreover, since PDMS soft molds have short remolding times, and are easily feathered during manufacturing, production costs could be effectively reduced through features such as, low surface free energy, resistant to adhering to the mold during imprinting, and collocation of gas-assisted nanopowder imprinting of micro-structural processes.     

Smoothing spectral power distribution of daylights

CIE Division 1 entrusted TC 1–74 to investigate the possibility to develop a smooth curve version of the D illuminants. This article investigates the possibility to create such smoothed curves with minimal colorimetric error. Six different smoothing algorithms were investigated; the best method, using a locally weighted regression and smoothing algorithm, enabled a smooth function, where the worst colour difference for a 100 000 sample set was less than ΔE_ab^* = 0.5, comparing calculations using the CIE standard daylight spectrum and the smoothed function. Thus, the smoothed function can be recommended for redefining the daylight spectra for colorimetry without loosing continuity to results using the current calculation tables and for designing daylight simulator spectra. © 2012 Wiley Periodicals, Inc. Col Res Appl, 38, 316–321, 2013     

Illuminant invariance from a single reflected light

This article presents an algorithm for computing an illuminant‐invariant quantity inherent in a single pixel of an imaged object color. The invariance pertains for two different assumptions about the illuminant spectrum: the photoreceptor sensitivities and the reflectance spectrum of the object. For one regime the illuminant spectrum is exponential, the photoreceptor sensitivities are equal‐width Gaussians, and the reflectance is also Gaussian. For the other regime the illuminant is a Wien approximation to a blackbody radiator, the photoreceptor sensitivities are narrow band in wavelength, and the reflectance is unconstrained. The existence of two regimes for the invariant testifies to its robustness. Computing this invariant over all pixels in an image will assist object‐color recognition (machine‐vision color constancy) without resorting to the usual assumption that illuminant variation over a scene is gradual compared to reflectance variation over that scene. © 2002 John Wiley & Sons, Inc. Col Res Appl, 27, 45–48, 2002