Design and Manufacture of GeSi/Si Superlattice Nanocrystalline Photodetector

According to Maxwell＇s theory, the optical transmission characteristics in GeSi/Si superlattice nanocrystalline layer have been analyzed and calculated. The calculated result shows that when the total thickness L is 340 nm, the single mode lightwave can be transmitted only at periodic number M≥15.5. In addition, at the direction of transmission, when the transmission distance is larger than 500 μm, the lightwave intensity is decreased greatly. Based on the above parameters, the design and manufacture of GeSi/Si superlattice nanocrystalline photodetector are carried out.     

Damage and strain in pseudomorphic vs relaxed GexSi1−x layers on Si(100) generated by Si ion irradiation

We compare both the strain and damage that 100 keV Si irradiation at room temperature introduces in pseudomorphic and relaxed Ge_xSi_1−x films grown on Si(100) substrates. The ion range is such that the Si/Ge_xSi_1−x interface is not significantly damaged. The amount of damage produced in pseudomorphic and relaxed Ge_xSi_1−x layers of similar x for irradiation doses up to 2.5 × 10¹⁴ Si/cm² is the same, which proves that a pre-existing uniform strain does not noticeably affect the irradiation-induced damage. However, the irradiation-induced strain does depend on the pre-existing strain of the samples. Possible interpretations are discussed. On leave from Inst. voor Kern en Stralingsfysika, Catholic University of Leuven, Belgium.     

Recent progress in GeSi electro-absorption modulators

Electro-absorption from GeSi heterostructures is receiving growing attention as a high performance optical modulator for short distance optical interconnects. Ge incorporation with Si allows strong modulation mechanism using the Franz–Keldysh effect and the quantum-confined Stark effect from bulk and quantum well structures at telecommunication wavelengths. In this review, we discuss the current state of knowledge and the on-going challenges concerning the development of high performance GeSi electro-absorption modulators. We also provide feasible future prospects concerning this research topic.     

In situ RHEED control of self-organized Ge quantum dots

In situ registration of high-energy electron diffraction patterns was used for constructing the diagram of structural and morphological states of the Ge film on the Si(100) surface. The following regions identified in the diagram: two-dimensional (2D)-growth, ‘hut’- and ‘dome’-clusters, ‘dome’-clusters with misfit dislocations at the interface. Variations in the lattice constants of the Ge film during the MBE growth on the Si(100) surface were determined. An increase in the lattice constant at the (100) surface was attributed to the elastic deformation at the stage of 2D growth and formation of ‘hut’-clusters and to the plastic relaxation for the ‘dome’-clusters. As a result, epitaxial silicon structures with germanium quantum dots of 15 nm base size at the density of 3×10¹¹ cm⁻² were synthesized. The total electron structure of the hole spectrum of Ge quantum dots in Si was established.     

Ge_xSi_(1-x)电光调制器与探测器的集成

在Ge_xSi_1-x电光调制器和探测器已经问世的基础上，提出了一种将它们集成起来的结构，通过原理和工艺技术的分析，认为这种光电集成是完全可以实现的。     

Ge/Si量子点的生长研究进展

要有效应用SK模式生长的Ge量子点,必须实现Ge量子点的位置可控并且进一步缩小Ge量子点的尺寸.阐释了这方面的研究进展,特别对图形衬底生长Ge量子点,利用Si表面的自组织性在错切割的邻晶面衬底上生长有序Ge岛,表面杂质诱导成岛这三个方面的进展加以介绍分析.     

Comparison of GexSi1—x Grown by UHV／CVD from Si2H6／GeH4 and SiH4／GeH4

Using double crystal X-rays diffraction (DCXRD) and atomic force microscopy (AFM), the results of Ge x Si 1- x grown by UHV/CVD from Si 2H 6 and SiH 4 are analyzed and compared. Adsorbates can migrate to the energy-favoring position due to the slow growth rate from SiH 4. In this case, a Si buffer that isolates the effect of substrate on epilayer could not be grown, which results in a pit penetrating into epilayer and buffer. The FWHM is 0.055° in DCXRD from SiH 4. The presence of diffraction fringes is an indication of an excellent crystalline quality. The roughness of the surface is improved if grown by Si 2H 6; however, the crystal quality of the Ge x Si 1- x material became worse than that from SiH 4 due to much larger growth rate from Si 2H 6. The content of Ge is obtained from DCXRD, which indicates the growth rate from Si 2H 6 is largest, then GeH 4, and that from SiH 4 is least.     

具有高电流处理能力的多发射极条微波功率GeSi HBT

本文对多发射极条(指)微波功率GeSi HBT进行了设计、制造和测试,并就测试结果对电流处理能力进行了研究.实验结果表明,对20～80指的GeSi HBT,发射极单位长度的电流密度I0在1.67～1.06A/cm之间变化.随发射极条数的增加,I0逐渐减少,分析认为这是由发射极条之间的热耦合引起有源区的温度非均匀分布而导致的.并且通过测试所得到的I0值,证明多指GeSi HBT可通过选择合适的发射极条数、条长和发射区面积获得更高的电流处理能力.     

高性能八位单片机AT89C51

介绍了由北京集成电路设计中心设计，美国生产的高性能八位单片机ＡＴ８９Ｃ５１的特点，结构及操作使用方法。     

电光开关与GeSi红外传感器集成 的可行性讨论

在研制成功ＧｅＳｉ全内反射型电光开关的基础上，对这种电光开关与ＧｅＳｉ／Ｓｉ ＳＬＳ红外传感器的集成可行性进行了深入探索。