IMEC Industrial Affiliation Program (IIAP) as IPR model to set up nanotechnology research and patenting

The IP policy of IMEC is to avoid IP blocking among its research and business partners, to secure IPR for partners and to enable publications for researchers. This is achieved by setting up a specially designed Industrial Affiliation Program (referred to as IIAP) with licensing and/or co-ownership of IP between the partners. The business IP model applied within the IIAP model at IMEC is characterised by an open, multi-party approach with non-exclusive licensing as a base-line. The IIAP model is further characterized as an IP model in which dilution of IP is minimized in view of further transferability of technology. Using the cost-based and risk sharing approach of the IIAP program, an enhanced progress within new technology domains such as nanotechnology is obtained.     

半导体IC清洗技术

介绍了半导体IC制程中存在的各种污染物类型及其对IC制程的影响和各种污染物的去除方法,并对湿法和干法清洗的特点及去除效果进行了分析比较。     

复杂目标电磁散射混合算法

分析了复杂目标高频散射雷达截面(RCS)计算理论,提出了一种有效的混合算法.改进了等效电磁流方法(IMEC),推导了几何光学/物理光学区域投影算法(GO/PO).IMEC能有效地消除反射边界和阴影边界的奇异性,GO/PO法用于计算多重散射.通过AutoCAD软件,使用三角面元法构建目标三维模型.目标的高频雷达散射截面通过几何光学、物理光学、改进的等效电磁流和几何光学/物理光学区域投影等混合方法计算获得.同时,计算了某型号导弹的RCS,理论值同测量结果基本一致,说明该方法能满足复杂目标电磁散射分析的需要.