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排序方式: 共有188条查询结果,搜索用时 15 毫秒
1.
本文报道采用液相外延(LPE)生长和传统光刻制管工艺研制出引入多层(三层或三层以上)中间能带隙过渡的吸收区、倍增区分离的InGaAs(P)/InP雪崩光电二极管(简称InGaAs(P)/InPSAGMAPD),其技术指标为:击穿电压VB=40~90V;0.9VB时的暗电流Id最小可小于10nA;1.3μm时光响应度Re=0.6~0.8A/W,倍增因子M≥20(Mmax>40),过剩噪声因子F≌5和较宽频带响应特性。 相似文献
2.
O. Gravrand E. De Borniol S. Bisotto L. Mollard G. Destefanis 《Journal of Electronic Materials》2007,36(8):981-987
This paper aims at studying the feasibility of very long infrared wavelength (VLWIR) (12–18 μm) focal plane arrays using n-on-p planar ion-implanted technology. To explore and analyze the feasibility of such VLWIR detectors, a set of four Cd
x
Hg1−x
Te LPE layers with an 18 μ cutoff at 50 K has been processed at Defir (LETI/LIR–Sofradir joint laboratory), using both our “standard” n-on-p process and our improved low dark current process. Several 320 × 256 arrays, 30-μm pitch, have been hybridized on standard Sofradir readout circuits and tested. Small dimension test arrays characterization
is also presented. Measured photonic currents with a 20°C black body suggest an internal quantum efficiency above 50%. Typical
I(V) curves and thermal evolution of the saturation current are discussed, showing that standard photodiodes remain diffusion
limited at low biases for temperatures down to 30 K. Moreover, the dark current gain brought by the improved process is clearly
visible for temperatures higher than 40 K. Noise measurements are also discussed showing that a very large majority of detectors
appeared background limited under usual illumination and biases. In our opinion, such results demonstrate the feasibility
of high-performance complex focal plane arrays in the VLWIR range at medium term. 相似文献
3.
利用变温和变磁场霍尔测试对在空气室温环境长期存放的碲镉汞液相处延晶膜作了定期的检测,结果表明,晶膜的电学性质随时间有明显的改变,本文采用非均匀晶膜的层状模型对晶膜的不稳定性作了详细的分析。 相似文献
4.
采用N-InP衬底研制InGaAsP/InP激光器和DFB激光器在国内已报导过多次,本文介绍用P-InP衬底研制InGaAsP/InP平面埋层异质结构激光器和DFB-PFBH激光器,同时利用晶体生长和晶向的依赖关系,改进埋区的结构,使器件最高激射温度大于100℃。 相似文献
5.
通过对液相外延(LPE)生长的外延片不同处理方法的研究,摸索出一条利用扫描电子显微镜(SEM)来观测有源区厚度的有效方法──蒸金法,最优可观察有源区厚度20nm,对设计厚度为18nm结构来说[1],这是一种便利而有效的观察手段。 相似文献
6.
The present paper strives for optimization of the cooling system of a liquid‐propellant engine (LPE). To this end, the new synthetic metamodel methodology utilizing the design of experiment method and the response surface method was developed and implemented as two effective means of designing, analyzing, and optimizing. The input variables, constraints, objective functions, and their surfaces were identified. Hence, the design and development strategy of combustion chamber and nozzle was clarified, and 64 different experiments were carried out on the RD‐161 propulsion system, of which 47 experiments were approved and compatible with the problem constraints. This engine used all three modes of cooling: the radiation cooling, the regenerative cooling, and the film cooling. The response surface curves were drawn and the related objective function equations were obtained. The analysis of variance results indicate that the developed synthetic model is capable to predict the responses adequately within the limits of input parameters. The three‐dimensional response surface curves and contour plots have been developed to find out the combined effects of input parameters on responses. In addition, the precision of the models was assessed and the output was interpreted and analyzed, which showed high accuracy. Therefore, the desirability function analysis has been applied to LPE's cooling system for multiobjective optimization to maximize the total heat transfer and minimize the cooling system pressure loss simultaneously. Finally, confirmatory tests have been conducted with the optimum parametric conditions to validate the optimization techniques. In conclusion, this methodology optimizes the LPE's cooling system, a 2% increase in the total heat transfer, and a 38% decrease in the pressure loss of the cooling system. These values are considerably large for the LPE design. 相似文献
7.
8.
陈诺夫 《河北工业大学学报》1992,(2)
本文采用阳极氧化工艺制备AlGaAs/GaAs自身氧化膜,进而制成MOS结构。对氧化膜的组分和稳定性,以及MOS结构的C—V特性进行了实际测量和理论分析。实验结果表明:经氮气退火后的氧化膜的电学性质稳定。本文得出了适合于深能级瞬态谱测试的MOS结构,及采用MOS结构进行DLTS测试的测试条件。 相似文献
9.
Layers of LPE GaAs have been grown with background carrier levels in the low 1014 cm−3 range by systematic bakeouts of the Ga melts together with between-run loading in a dry N2 environment. High resistivity layers in the range 103-104Ω cm have been grown by making use of the compensation of free carriers by the out diffusion of Cr from the substrate. Intentional
Cr-doping from the melt resulted in layers with poor surface morphologies. Buffered MESFET structures have been grown which
show near ideal carrier concentration profiles and which do not exhibit interfacial space charge effects. 相似文献
10.
Selective liquid phase epitaxy (SLPE) of high purity(n = 2 × 1015 cm-3) In0.53Ga0.47As on SiO2-masked (100)-InP:Fe substrates has been performed and investigated using Normarski interference contrast microscopy and SEM.
The infill growth was done at low temperatures (˜ 585° C) directly into chemically (HC1:CH3COOH:H2O2) etched cavities without melt-etching. Square and circular recesses of 2–3 μm depth and varying size (100-500 μm) have been
used in contrast to common reported regrowth experiments in long channels. Enormously enhanced growth rates have been found
within the small structures. Orientation dependent growth effects are described. The realization of selectively grown areas
with flat surface morphology has been achieved which is important for optoelectronic integration.
Most information contained in this paper was presented at the 27th Electronic Materials Conference, Boulder, Co., June 20,
1985. 相似文献