GaN and AlGaN high-voltage rectifiers grown by metal-organic chemical-vapor deposition

In this paper, we report the study of the electrical characteristics of GaN and AlGaN vertical p-i-n junctions and Schottky rectifiers grown on both sapphire and SiC substrates by metal-organic chemical-vapor deposition. For GaN p-i-n rectifiers grown on SiC with a relatively thin “i” region of 2 μm, a breakdown voltage over 400 V, and forward voltage as low as 4.5 V at 100 A/cm² are exhibited for a 60-μm-diameter device. A GaN Schottky diode with a 2-μm-thick undoped layer exhibits a blocking voltage in excess of ∼230 V at a reverse-leakage current density below 1 mA/cm², and a forward-voltage drop of 3.5 V at a current density of 100 A/cm². It has been found that with the same device structure and process approach, the leakage current of a device grown on a SiC substrate is much lower than a device grown on a sapphire substrate. The use of Mg ion implantation for p-guard rings as planar-edge terminations in mesageometry GaN Schottky rectifiers has also been studied.     

CMOS兼容近红外Si0.7Ge0.3/Si p-i-n(SOI)光电探测器

报道了一种采用UHV/CVD锗硅工艺和CMOS工艺流程在SOI衬底上制作的横向叉指状Si0.7Ge0.3/Si p-i-n光电探测器.测试结果表明:其工作波长范围为0.7～1.1μm,在峰值响应波长为0.93μm,响应度为0.38A/W.在3.0V的偏压下,其暗电流小于1nA,寄生电容小于1.0pF,上升时间为2.5ns.其良好的光电特性以及与CMOS工艺的兼容性,为研制能有效工作于近红外光的高速、低工作电压硅基光电集成器件提供了一种新的尝试,在高速光信号探测等应用中有一定的价值.     

Photoconductivity and photoluminescence under bias in GaInNAs/GaAs MQW p-i-n structures

The low temperature photoluminescence under bias (PLb) and the photoconductivity (PC) of a p-i-n GaInNAs/GaAs multiple quantum well sample have been investigated. Under optical excitation with photons of energy greater than the GaAs bandgap, PC and PLb results show a number of step-like increases when the sample is reverse biased. The nature of these steps, which depends upon the temperature, exciting wavelength and intensity and the number of quantum wells (QWs) in the device, is explained in terms of thermionic emission and negative charge accumulation due to the low confinement of holes in GaInNAs QWs. At high temperature, thermal escape from the wells becomes much more dominant and the steps smear out.     

Atomic scale modeling of electrically doped p-i-n FET from adenine based single wall nanotube

The Field Effect Transistor (FET) characteristics has been observed from a single-walled Adenine nanotube device using Density Functional Theory associated with Non Equilibrium Green’s Function based First Principle approach. This device is electrically doped which shows both n and p channel characteristics of a p-i-n FET. This device is designed and originated from a single-walled biomolecular nanotube structure. The p and n regions have been induced at the two ends of the device using electrical doping process. Thus both n and p channel current-voltage response can be obtained within a single nano-scale device at room temperature operation. The device is 3.35 nm long and 1.4 nm wide. The quasi-ballistic quantum transmission property reveals impressive and almost ideal current-voltage characteristics of the FET. Highest Occupied Molecular Orbital (HOMO) and Lowest Unoccupied Molecular Orbital (LUMO) gap reveals the possibility of quasi-ballistic coherent transmission of the device. The electronic properties based on Molecular Projected Self-consistent Hamiltonian are analyzed using Hilbert space spanned basis functions. The maximum tunneling current observed for the bio-molecular FET is 15.9 μA for n-channel and 13.8 μA for p-channel. The device is operated in atomic scale regime with 1000 THz frequency. The present results reveal the role of quantum-ballistic tunneling phenomenon in the current-voltage characteristics and channel conductance properties of the bio nanotube structure, which is useful in future generation nano-electronics.     

Computer modelling and analysis of the photodegradation effect in a-Si:H p-i-n solar cell

Using a previous model, which was developed to describe the light-induced creation of the defect density in the a-Si:H gap states, we present in this work a numerical modelling of the photodegradation effect in the a-Si:H p-i-n solar cell under continuous illumination. We first considered the simple case of a monochromatic light beam with a wavelength λ between 530-540 nm non uniformly absorbed, then the global standard solar spectrum (AM 1.5) illumination is taken into account. The photodegradation is analysed on the basis of the resulting changes in the free carrier's densities, recombination rate, band structure, electrical potential and field, space charge, and current densities. Changes in the cell's external parameters: the open circuit voltage V_oc, the short circuit current density J_sc, the fill factor FF and the maximum power density P_max are also presented.     

日盲探测器高Al组分n-Al0.6Ga0.4N欧姆接触

研究了应用于目盲探测器的高Al组分Si掺杂n型Al0.6Ga0.4N与两层金属层Ti(20nm)/Al(100nm)之间的欧姆接触.在制作金属电极前用煮沸王水对样片进行表面预处理,会属制作后再在N2氛了围中做快速热退火处理.使用高精度XRD测试样品表面特性,并对不同温度下的情况进行比较.样品的比接触电阻率是用环形传输线模型通过Ⅰ-Ⅴ测试得到.670℃下90s退火得到最优ρc为3.42×10-4n·cm2.将该处理方法应用到实际的背照式AlGaN p-i-n日盲探测器中,探测器的光谱响应度和反向特性等参数得到很大的优化.     

高温AlN为模板的AlGaN基p-i-n背照式日光盲探测器

第一次报道了以高温AlN为模板层的AlGaN基p-i-n背照式日光盲探测器的制作和器件特性.利用MOCVD方法在(0001)面的蓝宝石衬底上生长了探测器的AlxGa1-xN多层外延材料.在无需核化层的高温AlN模板上生长了p-i-n背照式日光盲探测器的无裂纹高Al组分(0.7)AlGaN多层外延结构.利用在线反射监测仪、三轴X射线衍射及原子力显微镜表征了外延材料的晶体质量.在1.8V的反向偏压下,制作的探测器表现出了日光盲响应特性,在270nm处最大响应度为0.0864A/W.具有约3.5V的正向开启电压,大于20V的反向击穿电压,在2V的反向偏压下暗电流小于20pA.     

日盲探测器高Al组分n-Al_(0.6)Ga_(0.4)N欧姆接触(英文)

研究了应用于日盲探测器的高Al组分Si掺杂n型Al0.6Ga0.4N与两层金属层Ti（20nm）/Al（100nm）之间的欧姆接触.在制作金属电极前用煮沸王水对样片进行表面预处理,金属制作后再在N2氛围中做快速热退火处理.使用高精度XRD测试样品表面特性,并对不同温度下的情况进行比较.样品的比接触电阻率是用环形传输线模型通过I-V测试得到.670℃下90s退火得到最优ρc为3.42×10-4Ω·cm^2.将该处理方法应用到实际的背照式AlGaN p-i-n日盲探测器中,探测器的光谱响应度和反向特性等参数得到很大的优化.     

高性能背照式GaN/AlGaN p-i-n紫外探测器的制备与性能

研究了GaN/AlGaN异质结背照式p-i-n结构可见盲紫外探测器的制备与性能。GaN/AlGaN外延材料采用金属有机化学气相沉积（MOCVD）方法生长，衬底为双面抛光的蓝宝石，缓冲层为AlN，n型层采用厚度为0.8 μm的Si掺杂Al0.3Ga0.7N形成窗口层，i型层为0.18 μm的非故意掺杂的GaN，p型层为0.15 μm的Mg掺杂GaN。采用Cl2、Ar和BCl3感应耦合等离子体刻蚀定义台面，光敏面面积为1.96×10-3 cm2。可见盲紫外探测器展示了窄的紫外响应波段，响应区域为310~365 nm，在360 nm处响应率最大，为0.21 A/W，在考虑表面反射时，内量子效率达到82％；优质因子R0A为2.00×108 Ω·cm2，对应的探测率D*=2.31×1013 cm·Hz1/2·W-1；且零偏压下的暗电流为5.20×10-13 A。     

Fabrication of amorphous silicon p-i-n solar cells using ion shower doping technique

We have studied the fabrication of amorphous silicon (a-Si : H) p-i-n solar cells using an ion shower doped n⁺-layer. The p-i-n cells with ion-doped n⁺-layer exhibited open-circuit voltage of > 0.8 V, fill factor of > 0.62 and conversion efficiency of > 8.4% when the ion acceleration voltage was between 3 and 7 kV. The a-Si : H p-i-n solar cell fabricated under an optimized ion-doping condition exhibited an open-circuit voltage of 0.84 V, a fill factor of 0.66 and a conversion efficiency of 9.9% which was very similar to those of conventional a-Si : H p-i-n cells fabricated in the same deposition chamber. Therefore, ion shower doping technique can be applied to fabricate large area, high performance a-Si : H p-i-n solar cells.