Knowledge-directed Adaptation in Multi-level Agents

Most work on adaptive agents have a simple, single layerarchitecture. However, most agent architectures support three levels ofknowledge and control: a reflex level for reactive responses, a deliberatelevel for goal-driven behavior, and a reflective layer for deliberateplanning and problem decomposition. In this paper we explore agentsimplemented in Soar that behave and learn at the deliberate and reflectivelevels. These levels enhance not only behavior, but also adaptation. Theagents use a combination of analytic and empirical learning, drawing from avariety of sources of knowledge to adapt to their environment. We hypothesize that complete, adaptive agents must be able to learn across all three levels.     

SOI亚微米波导光栅的设计与制作

报道了SOI基亚微米小尺寸波导光栅器件的设计、制作与测试结果。提出了波导与光栅同步制作的方案,避免了套刻,节约了成本。实验中采用电子束光刻(EBL)、感应耦合等离子体(ICP)刻蚀等先进半导体工艺技术,结合图形补偿等技术手段,完成了亚微米波导光栅的制作。光栅周期为350nm,占空比16∶19。采用该光栅做反射镜,制作了法布里-珀罗(F-P)谐振腔,经测试得到了与模拟相吻合的结果,峰谷比达到11dB。     

光刻探头的共振压力显微系统的研究

以磁共振压力显微和半导体核子自旋态研究为目的,采用电子束和等离子体刻印方法制备硅振荡器,脉冲调制序列控制磁共振条件频率和旋转框架翻转,依据样品的自旋-晶格弛豫时间和自旋-自旋弛豫时间,获得了共振显微压力,测试了压力显微的灵敏度。结果表明,光刻的探头具有高Q值和软悬臂低倔强系数K,磁共振压力通过扫描片段和激光光纤干涉得到了极其微小的压力。光刻探头的共振压力显微具有高空间分辨率,兼具核磁共振成像(MRI)和原子压力显微技术(AFM)优点,是一种重要的核自旋探测技术和三维原子分辨率成像的有力方法。     

前进中的曝光技术

简述了曝光的历史和发展趋势及当前的技术状态和技术难点,指出了将来的发展思路。     

0.1μmT型栅PHEMT器件

通过电子束和接触式曝光相结合的混合曝光方法 ,并利用复合胶结构 ,一次电子束曝光制作出具有 T型栅的 PHEMT器件 ,并对 0 .1μm栅长 PHEMT器件的整套工艺及器件性能进行了研究 .形成了一整套具有新特点的PHEMT器件制作工艺 ,获得了良好的器件性能 (ft=93.97GHz;gm=6 90 m S/mm ) .     

Application of near infrared spectroscopy for the rapid determination of antioxidant activity of bamboo leaf extract

This study was carried out to evaluate the feasibility of using near infrared (NIR) spectroscopy for determining three antioxidant activity indices of the extract of bamboo leaves (EBL), specifically 2,2-diphenyl-1-picrylhydrazyl (DPPH), ferric reducing/antioxidant power (FRAP), and 2,2′-azinobis-(3-ethylbenz-thiazoline-6-sulfonic acid) (ABTS). Four different linear and nonlinear regressions tools (i.e. partial least squares (PLS), multiple linear regression (MLR), back-propagation artificial neural network (BP-ANN), and least squares support vector machine (LS-SVM)) were systemically studied and compared in developing the model. Variable selection was first time considered in applying the NIR spectroscopic technique for the determination of antioxidant activity of food or agricultural products. On the basis of these selected optimum wavelengths, the established MLR calibration models provided the coefficients of correlation with a prediction (r_pre) of 0.863, 0.910, and 0.966 for DPPH, FARP, and ABTS determinations, respectively. The overall results of this study revealed the potential for use of NIR spectroscopy as an objective and non-destructive method to inspect the antioxidant activity of EBL.     

Amine-cured epoxy surface morphology and interphase with copper: an approach employing electron beam lithography and scanning force microscopy

The interphase between polymer and metal was investigated for further understanding of the mechanical properties. In particular, an analysis of the stiffness can provide significant information to determine the stress distribution in the interphase. The polymer–metal interphase was prepared by applying epoxy on micrometer-scale copper structures, which were created by electron beam lithography (EBL). The stiffness was characterized by force modulation microscopy (FMM), which is a scanning force microscopy (SFM)-based technique. According to the analysis, a stiffness variation was observed in the interphase. It showed a lower stiffness in the interphase than in the bulk epoxy, which is far from the copper structures. In addition, the morphology of epoxy surface was studied. The nodules on the epoxy surface were characterized and the average length was found to be approx. 76 nm. FMM showed adequate sensitivity to visualize the nodules on the epoxy. Therefore, FMM can also be a very effective method to analyze epoxy morphology and the stiffness in the interphase along with the topography images.     

单电子晶体管及其工艺制作技术

基于库仑阻塞效应和量子尺寸效应工作的单电子晶体管(SET)由于具有超小器件尺寸、超低功耗、超低工作电流和超高工作频率等特点,受到人们的重视和深入研究。本文通过简要介绍SET的器件结构、原理和特性,分析了实现SET的关键因素,回顾和评述了SET制作技术的进展及前景。     

Controllable growth of ZnO nanorod arrays with different densities and their photo-electric properties

ABSTRACT: Since the photo-electric response and charge carriers transport can be influenced greatly by the density and spacing of the ZnO nanorod arrays, controlling of these geometric parameters precisely is highly desirable but rather challenging in practice. Here, we fabricated patterned ZnO nanorod arrays with different density and spacing distance on silicon (Si) substrate by electron beam lithography (EBL) method combined with the subsequent hydrothermal reaction process. By using the EBL method, patterned ZnO seed layers with different areas and spacing distances were obtained firstly. ZnO nanorod arrays with different density and various morphologies were obtained by the subsequent hydrothermal growth process. The combination of EBL and hydrothermal growth process was very attractive and made us could control the geometric parameters of ZnO nanorod arrays expediently. Finally, the vertical transport properties of the patterned ZnO nanorod arrays were investigated through the micro probe station equipment and the I-V measurement results indicated that back-to-back Schottky contacts with different barriers height were formed in dark conditions. Under UV light illumination, the patterned ZnO nanorod arrays showed a high UV light sensitivity, and the response ratio was about 104. The controllable fabrication of patterned ZnO nanorod arrays and understanding for their photo-electric transport properties were helpful to improve the performance of nanodevices based on them.