Simulations of Temperature Field in HFCVD Diamond Films over Large Area

A three-dimensional model was developed to investigate the influence of various hot filaments parameters on substrate temperature fields that significantly affect the nucleation and growth of diamond films over large area by hot-filament chemical vapordeposition (HFCVD). Numerical simulated results indicated that substrate temperature varies as a function of hot filamentsnumber, radius, temperature, emissivity, the distance between filaments, and the distance between substrate and filamentsarrangement plane. When these filaments parameters were maintained at the optimal values, the homogeneous substrate temperature region of 76 mm×76 mm with the temperature fluctuation no more than 5% could be obtained by a 80 mm×80 mmhot filaments arrangement plane. Furthermore, the homogeneous region could be enlarged to 100 mm×100 mm under thecondition of supplementary hot filaments with appropriate parameters. All of these calculations provided the basis for speciallyoptimizing the hot filaments parameters to dep     

基于金刚石薄膜的微间隙室制备

采用金刚石薄膜作为阴-阳极间绝缘介质层是一种新型的微间隙室(MGC)结构。该文详细介绍和讨论了采用常规的微细加工工艺制备基于金刚石薄膜介质层的MGC的制备技术,其典型结构为阳极微条宽20μm,微条间隔180μm,器件探测区面积为38 mm×34 mm。采用热丝CVD法制备的金刚石薄膜作为阴-阳极间绝缘介质层,厚7~8μm,具有(100)晶面结构。金刚石的刻蚀采用反应离子刻蚀,Cr作掩膜,O2和SF6为刻蚀气体,刻蚀速率为79 nm/min,与Cr的刻蚀比约为20:1。实验结果表明,采用的微加工结合自套准工艺可很好地解决金刚石薄膜的制备、图形化及金属阳极电极与金刚石薄膜的相互套准等金刚石薄膜的可加工性及兼容性问题,并制备出采用金刚石薄膜作为电极间绝缘介质层的新型MGC结构。     

非金刚石相碳成分对金刚石薄膜晶形的影响

应用Raman光谱和SEM方法研究了在用热丝CVD方法生长金刚石薄膜中,生长膜中非金刚石相碳成分对金刚石晶粒晶形的影响。还讨论了生长条件如碳源浓度、衬底温度等对生长膜中非金刚石相碳成分的影响     

Magnesium interlayered diamond coating on silicon

Diamond thin films have been deposited using hot filament chemical vapour deposition technique on manually scratched p-Si(1 0 0) substrate, with and without magnesium interlayer. In spite of magnesium melting point being lower (T_m = 649 °C) than the growth temperature of the substrate (T_s  750 °C) used in these experiments, it was found that high quality diamond films could be grown on Mg covered substrate. A liquid substrate is probably generated during the diamond film growth. Raman spectroscopy analysis exhibited only the triply degenerate, zone centre optical phonon peak at 1333 cm⁻¹ indicating that nearly stress free crystallites were present. Broadening of the Raman peak (11.76 cm⁻¹) indicates that some small crystallites also are present. Scanning electron and atomic force microscopy accompanied by X-ray diffraction analysis where used to compare the details of diamond film growth directly on scratched Si(1 0 0) and Mg interlayered scratched Si(1 0 0) substrates.     

硬质合金激光改性协同仿生微织构对硼掺杂金刚石涂层性能的影响

目的 研制应用于超精密加工领域的高性能金刚石涂层,探究硬质合金基体表面激光微织构对硼掺杂金刚石(BDD)涂层沉积质量的影响,分析不同类型的仿生微织构对基–膜结合强度、工具切削性能的改善效果及原因。方法 在硬质合金表面使用激光脉冲制备不同类型的仿生微织构,并通过热丝化学气相沉积(HFCVD)法在刀具表面沉积BDD涂层。采用数显洛氏硬度计(HRS-150)、超景深三维显微镜、扫描电子显微镜(SEM)、能谱仪(EDS)、白光干涉表面轮廓仪、拉曼光谱(Raman)对样品进行表征。通过压痕试验及铣削试验研究涂层的附着强度和刀具的切削性能。结果 激光微织构边缘发生表面硬化。激光微织构区域沉积BDD涂层后,基体表面缺陷显著降低,织构内部金刚石晶粒更密集,沉积质量提升,三角织构(TT)边缘的金刚石颗粒堆积坡度最缓,不同类型的织构化BDD涂层的粗糙度、金刚石纯度、切削性能及附着强度均不同,涂层附着力与表面硬度呈正相关。硼掺杂三角织构(BDTTD)涂层刀具具有最佳的切削性能。结论 织构边缘和内部具有更高的金刚石二次成核率和沉积质量。织构的存在可以提升BDD涂层的附着强度和刀具性能,并且织构边缘的涂层附着力最强,这些得益于激光烧蚀及仿生微织构对硬质合金表面的硬化及对BDD涂层内在缺陷的修复。     

CVD金刚石薄膜涂层整体式刀具的制备与应用

化学气相沉积(chemical vapor deposition,CVD)金刚石薄膜具有硬度高、摩擦系数低、耐磨性强以及表面化学性能稳定等优异的机械及摩擦学性能,这使其在硬质合金工模具领域具有广阔的应用前景.本文采用热丝化学气相沉积法(hot filament chemical vapor deposition,HFC...     

钽喷丝头表面覆加金刚石膜的研究

为改善钽喷丝头的品质,提高其硬度和耐碱腐蚀能力,利用热丝CVD制备不同粒径的金刚石薄膜,并通过对钽衬底的碳化处理,成功使之沉积于纯钽啧丝头表面,对纯钽喷丝头进行表面强化.通过场发射扫描电镜观察,大粒径金刚石薄膜有少量孔隙,小粒径金刚石薄膜细腻致密.硬度测试结果表明,金刚石薄膜钽喷丝头表面硬度达HV1 000以上,远高于纯钽及其它工艺处理后的钽喷丝头.可纺性试验结果表明,其性能都达到或超过传统喷丝头,完全可以取代成本高昂的铂金喷丝头.     

HFCVD法制备SiC材料及室温光致发光

利用热丝化学气相沉积法(HFCVD)以CH4和SiH4作为反应气体在Si衬底上制备了SiC薄膜。用X射线衍射(XRD)、傅立叶红外吸收谱(FTIR)等手段对样品进行了结构和组分分析，分析结果表明已经在Si衬底上制备了SiC薄膜。对所制备的SiC薄膜进行了光致发光测试，在室温下观察到了薄膜峰值位于417nm和436nm的较强的可见光发射，认为这两个相近的蓝光发射起源可能是光激发载流子从SiC晶粒核心激发．然后转移到SiC晶粒表面发光中心上的辐射复合。     

HFCVD法合成金刚石的初期生长过程

用XL30FEG扫描电镜对热丝化学气相沉积 (HFCVD)法合成的金刚石颗粒的初期生长过程进行了研究。结果表明 ,金刚石在 p -Si(10 0 )基片上的初始形核密度很高 ,可达 10 10 /cm2 ;在随后的颗粒长大过程中 ,颗粒快速长大 ,颗粒密度急剧减少 ;颗粒的长大速率随其尺寸的增大而减小 ,最后趋于一稳定值     

纳米金刚石薄膜的光学性能研究

用热丝化学气相(HFCVD)法在硅衬底上制备了表面光滑、晶粒致密均匀的纳米金刚石薄膜,用扫描电镜(SEM)和原子力显微镜(AFM)观测薄膜的表面形貌和粗糙度,拉曼光谱表征膜层结构,紫外-可见光分光光度计测量其光透过率,并用椭圆偏振仪测试、建模、拟合获得了表征薄膜光学性质的n,k值.结果表明薄膜的晶粒尺寸在100nm以下,表面粗糙度仅为21nm;厚度为3.26(m薄膜在632.8nm波长处的透过率为25%,1100nm波长处达到50%.采用直接光跃迁机制估算得到纳米金刚石薄膜的光学能隙(Eg)为4.3 eV.