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热丝法低温生长硅上单晶碳化硅薄膜 总被引:4,自引:0,他引:4
提出了热丝化学气相淀积法,在低温(600-750℃)下成功地生长出硅上单晶碳化硅薄膜,X光衍射谱、喇曼光谱证实了外延膜的单晶结构,光致发光测量证明外延SiC材料室温下可稳定发射可见光。 相似文献
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Anita R. Warrier 《Thin solid films》2010,518(7):1767-1773
Photothermal deflection technique (PTD) is a non-destructive tool for measuring the temperature distribution in and around a sample, due to various non-radiative decay processes occurring within the material. This tool was used to measure the carrier transport properties of CuInS2 and CuInSe2 thin films. Films with thickness < 1 μm were prepared with different Cu/In ratios to vary the electrical properties. The surface recombination velocity was least for Cu-rich films (5 × 105 cm/s for CuInS2, 1 × 103 cm/s for CuInSe2), while stoichiometric films exhibited high mobility (0.6 cm2/V s for CuInS2, 32 cm2/V s for CuInSe2) and high minority carrier lifetime (0.35 µs for CuInS2, 12 µs for CuInSe2). 相似文献
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