Luminescence and scintillation properties of rare-earth-doped LuF3 scintillation crystals

The Nd-doped and Er-doped LuF₃ single crystals were grown by the micro-pulling-down method to study their scintillation properties in the vacuum-ultraviolet (VUV) region. The doubly Nd–Er codoped single crystal was grown to study possibility of scintillation performance improvement by energy transfer from Er³⁺ to Nd³⁺ ions. The LiF flux was to avoid phase transition below melting temperature. The 1%Nd-doped sample showed the highest overall scintillation efficiency under X-ray excitation which was 7 times as high as that of the LaF₃:Nd 8% standard. The leading Nd³⁺ 5d–4f emission was situated at 176 nm, while the Er³⁺ 5d–4f emission for Er-doped samples was observed at 163 nm, which better matches the sensitivity of some VUV-sensitive photodetectors. The optimum Er concentration was determined to be around 1–3 mol%. No Er³⁺ 5d–4f emission was observed for the doubly Er,Nd-codoped sample due to energy transfer from the Er³⁺ to Nd³⁺ ions. Slight improvement of the light yield was observed in the doubly-doped sample with respect to the Nd-only doped one.     

Dy3+激活的几种硼酸盐在VUV-VIS范围的光谱性质

本文报道了SrAl2B2o7:Dy^3 、BaAl2B2O7:Dy^3 、SrAl3BO7:Dy^3 、La2CaB10O19:Dy^3 的紫外－真空紫外（UV－VUV）激发光谱和UV激发下的发射光谱。根据发射光谱讨论了Dy^3 离子在这几种基质中发光的黄蓝比（Y／B）。在VUV激发光谱中推测了Dy^3 的f-d跃迁及电荷迁移态（CTS）和基质吸收的位置。     

Comparison between photocatalytic ozonation and other oxidation processes for the removal of phenols from water

Photocatalytic ozonation (1O₃ + VUV + TiO₂), ozonation (O₃), catalytic ozonation (O₃ + TiO₂), ozone photolysis (O₃ + VUV), photocatalysis (TiO₂ + VUV) and photolysis (VUV) have been compared in terms of formation of intermediates, extent of, mineralization (TOC, COD, chloride, nitrate) and kinetics in the aqueous treatment of three phenols (phenol, p‐chlorophenol and p‐nitrophenol). In all cases, photocatalytic ozonation led to lower degradation times for chemical oxygen demand and total organic carbon removal. Intermediates formed were similar in the different oxidation systems with some exceptions. They can be classified into three different types: polyphenols (resorcinol, catechol, hydroquinone), unsaturated carboxylic acids (maleic and fumaric acids) and saturated carboxylic acids (glyoxylic, formic and oxalic acids). First order kinetic equations have been checked for the oxidation processes studied in the case of the parent compound. Rate constants of these systems have also been calculated. Copyright © 2005 Society of Chemical Industry     

氟化物的水热合成及其VUV发光性能

以中温水热法合成了NH4Y3F10，YF3，LiYF4等晶体氟化物及其荧光粉NH3Y3F10：Eu^3 LiYF4:Tb^3 ，并讨论了水热合成条件。用X-ray粉末衍射确定了物象，并用PowderX计算机软件进行了指标化，确定了晶格参数。还测定了NH4Y3F10：Eu^3 和LiYF4：Tb^3 荧光粉的VUV或UV光激发的激发光谱和发射光谱。     

短波长相干光与原子团受激发射

多种原子团及其离子已具有在VUV/XUV波段产生受激发射的能力。本文介绍了产生短波长相干辐射的方法、研究现状、研究方法和原子团的结构与受激发射。     

Energy transfer mechanism of GdPO4: RE3+ (RE = Tb, Tm) under VUV-UV excitation

Polycrystal of GdPO₄:RE³⁺ (RE=Tb, Tm) phosphors were prepared by solid-state method. Vacuum ultraviolet excitation and emission spectrum and the energy transfer mechanism between the host and dopants of Tb³⁺ and Tm³⁺ were investigated respectively. The emission of Gd³⁺ at 313 nm was enhanced by the strong absorption of CTS of Tm³⁺ at 180 nm in GdPO₄: Tm. It has also been concluded that the excitation of Gd³⁺ is transferred to Tb³⁺ and then emission peaks of ⁵D_J→⁷F_J of Tb³⁺ were observed.     

Characterization of (Y,Gd) BxV1-xO4-x:Eu Phosphor Prepared by Coprecipitation Reaction

White body-color (Y, Gd)BxV1- xO4-x :Eu3 phosphors were prepared by coprecipitation reaction. Under VUV excitation at 147 nm, the red emission colorimetric purity of (Y, Gd)BxV1- xO4-x :Eu3 phosphor is much better than that of commercial PDP (plasma display panels) phosphor (Y, Gd)BO3:Eu3 . But its relative emission intensity is only about 90% of the commercial phosphor.     

溶胶-凝胶法制备的BaMgAl10O17:Eu2+荧光性能研究

研究了柠檬酸为络合剂的溶胶-凝胶法制备的BaMgAl10O17Eu2+蓝色荧光粉的荧光性能,考察了Eu 2+掺杂量和晶化温度等因素对荧光粉的紫外和真空紫外波段激发的荧光性能的影响,并通过X射线衍射分析,探讨了Eu2+掺杂量引起的晶胞参数和荧光粉发射波长的变化.结果表明BaMgAl10O17Eu2+随着Eu2+掺杂量的增加,除荧光强度发生变化外,发射光谱的波长发生红移;真空紫外波段激发,Eu2+的最佳添加量为0.1,紫外波段激发下为0.12,发射峰波长均为450 nm;晶化时间2小时,温度在1300℃以上更好.     

Automated metrology system including VUV spectroscopic ellipsometry and X-ray reflectometry for 300 mm silicon microelectronics

Spectroscopic ellipsometry has long been recognized as the technique of choice to characterize thin films and multilayers. Instrumentation for the next generation of VUV lithography at 157 nm requires special optical setup since O₂ and H₂O are extremely absorbing below 190 nm. A new system has been developed which works into a purged glove box to reduce the oxygen and water contamination in the part per million range. Ellipsometric and photometric measurements vs. wavelength and angle of incidence can be performed. Grazing X-ray option has been added on the same instrument to provide a better picture of the analyzed samples. This paper presents in detail the new system with its two measurement methods, and includes experimental results gate dielectrics layers and high k dielectrics.     

VUV Enhanced XeF2 Fluorination of Polymer Surfaces

Abstract

Exposure of polyethylene and polystyrene to xenon difluoride (XeF₂) in the presence of vacuum ultraviolet (VUV) irradiation emitted from O₂,N₂, Ar, Kr and Xe electrical discharges gives rise to surface fluorination. The extent of reaction is found to be governed by the synergistic effect between the VUV absorption characteristics of the XeF₂ feed gas and the polymer substrate. Polystyrene in combination with krypton electrical discharge emission lines yields the most fluorinated surface.