类金刚石薄膜的光学性能的研究

利用脉冲真空电弧镀的方法,在硅基底上沉积类金刚石薄膜,研究薄膜的光学性能、光学常数和离子能量关系。结果表明:不同的离子能量可以得到不同折射率的薄膜,无氢类金刚石薄膜的折射率在2.5～2.7之间变化;通过改变工艺条件来制备不同折射率的薄膜,和不同折射率的基底材料相互匹配;折射率和光学能隙随离子能量具有相反的变化趋势,和理论预测的趋势相一致;对于硅、锗等红外材料,要求的薄膜应具有1.8～2.1左右的折射率,因此提出一种基于物理汽相沉积和化学汽相沉积两种相互结合的方法,来降低薄膜的折射率,以达到和硅、锗等材料的折射率匹配。

Study on the optical properties of the diamond-like carbon films

In this paper, diamond-like carbon films are prepared by pulsed vacuum arc deposition on silicon substrate. The relations among ion energy and optical properties and constants are studied. The result show that different films′ refractive index and optical energy gap will be gained in using different ion energy. The films, whose refractive index is expected before preparing, will be reached by changing condition in order to mach different substrate. The range of the value of refractive index vary from 2.5 to 2.7,but the refractive index of the diamond-like carbon films should be about 1.8~ 2.1, as a kind of anti-reflective films on Ge or Si substrate. By comparing PVD and CVD, a new kind of method to prepare diamond-like carbon is suggested to decrease the refractive index.