真空阴极弧离子镀类金刚石碳（DLC）膜的碳弧稳定性研究

选用氩气、氩气加氢气、氩气加乙炔等气体作为介质，石墨作为靶材进行真空阴极弧离子镀来制备类金刚石碳膜。石墨电弧有其独特的电弧特性曲线，不同气体介质对碳弧特性的影响不同，磁场的大小对电弧的稳定性有很大作用，碳弧下基片偏流随电弧电压的增加而减小，试验得到表面光滑的类金刚石碳（DLC）膜，对膜的表面进行了SEM分析。

Study of Graphite Arc Stationary During Vacuum Arc Deposition of Diamond-like Carbon (DLC) Films

This paper deals with the character of the graphite arc in vacuum cathodic arc deposition, and the influence of feed gases such as Ar, H2 and Ar gas mixtures, C2H2 and Ar gas mixtures was analysised. The characteristic curve of vacuum arc has been got and the use of magnetic for achieving a steady and stable arc discharge was discussed. the relationship of substrate bias voltage and bias current with arc voltage was also discussed. Furthermore the smooth amorphous hydrogen-carbon films was got and was analysised by scanning electron microscopy.