分散剂对亚微米氮化硅粉体分散性能的影响

本文利用研磨机将氮化硅（Si3N4）粉体研磨至亚微米级,并分析分散剂对Si3N4颗粒粒度的影响。从四甲基氢氧化铵（TMAH）、六偏磷酸钠（SHMP）和Darvan—C这三种分散剂对亚微米SbN4分散性能的曲线图中可以看出．TMAH、SHMP和Darvan—c都有很强的抑制沉淀的作用,对亚微米Si3N4的分散效果较好。SHMP的加入量在1％时出现最佳值,随着加入量的逐渐增加,亚微米Si3N。的分散效果也逐渐变差。比较这三种分散剂,0．4％的Oarvan—C对亚微米Si3N4的分散效果优于1％的SHMP和0．8％的TMAH对Si3N4的分散效果。

Effect of Dispersants on Dispersion of Sub-micron Silicon Nitride

Silicon nitride powders were grinded to submicron level by ball mill and the effects of dispersants on dispersion of sub-micro silicon nitride are discussed by the measurements of sedimentation, rheological behavior and SEM. The results show that the three dispersants （TMAH, SHMP and Darvan-c） have a strong inhibitory effect on precipitation of Si3N4 powers and the Si3N4 powers are dispersed the best with 1% addition amount of SHMP, 0.8% addition amount of TMAH and 0.4% addition amount of Darvan-c respectively.