| 半绝缘多晶硅薄膜的制备与应用 |
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| 引用本文： | 尹贤文. 半绝缘多晶硅薄膜的制备与应用[J]. 微电子学, 1995, 25(1): 45-52 |
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| 作者姓名： | 尹贤文 |
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| 作者单位： | 电子工业部第２４研究所 |
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| 摘 要： | 本文对ＬＰＣＶＤ半绝缘多晶硅（ＳＩＰＯＳ）薄膜工艺进行了研究，分析和讨论了工艺参数对薄膜淀积过程以及性能的影响。并较详细介绍了ＳＩＰＯＳ薄膜在高压功率器件领域的应用。
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| 关 键 词： | LPCVD 半绝缘多晶硅 高压功率器件 SIPOS 薄膜 |
Deposition of Semi-Insulating Polysilicon Films and Their Applications |
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| Yin Xianwen. Deposition of Semi-Insulating Polysilicon Films and Their Applications[J]. Microelectronics, 1995, 25(1): 45-52 |
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| Authors: | Yin Xianwen |
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| Abstract: | An investigation is made into the deposition process of LPCVD semi-insulating polysilicon(SIPOS )films,Effects of process parameters on the deposition of the film and its porformance are analyzed and discussed. Applicationsof SIPOS films to high voltage power devices are intreduced. |
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| Keywords: | LPCVD Semi-insulating polysilicon High voltage / power device |
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