Swords to plowshares: Shock wave applications to advanced lithography

xtreme ltraiolet ithography (EUVL) seeks to apply radiation in a wavelength region centered near 13 nm to produce microcircuits having feature sizes 0.1 micron or less. A critical requirement for the commercial application of this technology is the development of an economical, compact source of this radiation which is suitable for lithographic applications. A good candidate is a laser-plasma source, which is generated by the interaction of an intermediate intensity laser pulse (up to 10¹² W/cm²) with a metallic target. While such a source has radiative characteristics which satisfy the needs of an EUVL source, the debris generated during the laser-target interaction strikes at the economy of the source. Here, we review the use of concepts and computer modeling, originally developed for hypervelocity impact analysis, to study this problem.