| 氩气在直流PCVD镀硬膜中的作用 |
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| 引用本文： | 赵程,李世直. 氩气在直流PCVD镀硬膜中的作用[J]. 青岛科技大学学报(自然科学版), 1996, 0(3) |
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| 作者姓名： | 赵程 李世直 |
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| 摘 要： | 探讨了在直流ＰＣＶＤ镀膜过程中反应气体中的惰性气体Ａｒ对膜的影响。实验发现，反应气体中加入０％－１０％Ａｒ可以显著提高膜的沉积速率，最高可以提高４０％。但是当气体中的Ａｒ超过１０％后，膜的沉积速率与Ａｒ的加入量无关。反应气体中加入Ａｒ还可以略微改善膜的组织结构和膜的耐磨性。
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| 关 键 词： | 等离子体化学气相沉积；硬膜；氩气 |
Effect of Argon on Hard Coatings in PCVD |
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| Zhao Cheng Li Shizhi. Effect of Argon on Hard Coatings in PCVD[J]. Journal of Qingdao University of Science and Technology:Natutral Science Edition, 1996, 0(3) |
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| Authors: | Zhao Cheng Li Shizhi |
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| Affiliation: | Institute of Plasma Surface Engineering |
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| Abstract: | The effect of Ar in reactive gases of PCVD on hard coatings has been studied.Ar increases the deposition rate of hard coatings up to 40%.The rate keeps constant when the amount of Ar exceeds 10% .Ar also improves the structure and wear resistance of hard coatings. |
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| Keywords: | plasma CVD hard coatings argon |
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