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Template synthesis of novel monolayer B4C ultrathin film
Authors:Lei Zhou  Jian Gao  Yang Liu  Jingshuang Liang  Muhammad Javid  Asif Shah  Xinglong Dong  Hongtao Yu  Xie Quan
Affiliation:1. Key Laboratory of Materials Modification by Laser, Ion and Electron Beams(Ministry of Education), School of Materials Science and Engineering, Dalian University of Technology, Dalian 116023, China;2. Department of Metallurgy and Materials Engineering, Dawood University of Engineering and Technology, Karachi, Pakistan;3. Key Laboratory of Industrial Ecology and Environmental Engineering (Ministry of Education), School of Environmental Science and Technology, Dalian University of Technology, Dalian 116024, China
Abstract:The excellent physical and chemical properties of two-dimensional (2D) ultrathin film of boron carbide (B4C) make it suitable for various applications. Nonetheless, the related fabrication strategies have not been well established yet. In this paper, the branches of dendritic magnesium oxide (MgO) nanofibers have been firstly used to serve as the template for synthesis of high-quality monolayer B4C ultrathin film. As a thermal source, DC arc-discharge plasma was adopted to co-evaporate the raw mixture target comprising of boron, graphite and magnesium oxide species. In the evaporation and subsequent condensation processes, the scaffolds of crossed MgO nanofibers were built at higher temperature prior to heterogeneous nucleation of B4C nanosheets on them. It is indicated that the kneaded B4C films can wrap MgO nanofibers into a round-shaped sphere and were entirely stretched out by removal of MgO scaffolds through a simple water-washing purification. The monolayer B4C ultrathin film is about 1.5?nm in thickness and several micrometers in length. UV–vis diffuse reflectance spectra reveal that the band gap of B4C films is ~1.37?eV, which is around 50% higher than that of normal B4C films. This work describes the formation mechanism of such monolayer B4C ultrathin film in aspect of nucleation/growth processes under the high-temperature plasma conditions.
Keywords:MgO scaffolds  DC arc-discharge plasma  Band gap
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