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Arsonic Acid Self‐Assembled Monolayers Protect Oxide Surfaces from Micronewton Nanomechanical Forces
Authors:Natalie A LaFranzo  Joshua A Maurer
Affiliation:Washington University in St. Louis, Department of Chemistry, Center for Materials Innovation, One Brookings Drive, Campus Box 1134, Saint Louis, MO 63130, USA
Abstract:The development of new surface coatings is critical for combating wear and increasing the device lifetime in microelectromechanical systems (MEMS). Here, a class of arsonic acid self‐assembled monolayers (SAMs) is reported that form readily on oxide substrates including silicon oxide, borosilicate glass, and titanium oxide. Monolayers are easily prepared using a straightforward soaking technique, which is amenable to large‐scale commercial applications. Monolayer formation on borosilicate glass and titanium oxide is characterized using infrared spectroscopy. Monolayers on borosilicate glass, native silicon oxide and titanium oxide are evaluated with contact angle measurements, as well as wear measurements using nanoscratching experiments. On titanium oxide and borosilicate glass, monolayers prepared from hexadecylarsonic acid provide significantly greater surface protection than surfaces reacted under similar conditions with hexadecylphosphonic acid, a common modifying agent for oxide substrates.
Keywords:self‐assembled monolayers  organoarsonate  wear  nanotribology  nanoscratching
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