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Semiconductor Processing: Novel Hybrid Organic–Inorganic Spin‐on Resist for Electron‐ or Photon‐Based Nanolithography with Outstanding Resistance to Dry Etching (Adv. Mater. 43/2013) |
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| Authors: | Erika Zanchetta Gioia Della Giustina Gianluca Grenci Alessandro Pozzato Massimo Tormen Giovanna Brusatin |
| Affiliation: | 1. Industrial Engineering Department and INSTM, , 35131 Padova, Italy;2. CNR‐IOM, Laboratorio TASC, LILIT Beam Line, , 34149 Trieste, Italy |
| Abstract: | |
| Keywords: | alumina inorganic resists dry etching etching masks sol‐gel direct patterning |