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离子束增强沉积VO2多晶薄膜的相变模拟
引用本文:袁宁一,李金华,李格.离子束增强沉积VO2多晶薄膜的相变模拟[J].功能材料与器件学报,2004,10(3):332-336.
作者姓名:袁宁一  李金华  李格
作者单位:江苏工业学院,信息科学系,常州,213016;江苏工业学院,计算机工程系,常州,213016
基金项目:国家自然科学基金资助课题(No.60277019;No.10175027)
摘    要:用多晶薄膜晶粒—晶界两相结构模型,考虑晶格畸变和载流子对晶界势垒区的隧穿机制,在10~100℃范围内,模拟了离子束增强沉积(IBED)VO2多晶薄膜的相变。模拟结果显示,由于晶粒中间隙位置氩的存在,使VO2晶格畸变,导致了薄膜中部分晶粒的相交温度降低,使IBED VO2薄膜在48℃开始由半导体相向金属相转变。

关 键 词:VO2多晶薄膜  离子束增强沉积  晶格畸变  晶界隧穿
文章编号:1007-4252(2004)03-0332-05
修稿时间:2003年12月22

Phase transition simulation of the VO2 film prepared by ion beam enhanced deposition method
YUAN Ning-yi,LI Jin-hua,LI Ge.Phase transition simulation of the VO2 film prepared by ion beam enhanced deposition method[J].Journal of Functional Materials and Devices,2004,10(3):332-336.
Authors:YUAN Ning-yi  LI Jin-hua  LI Ge
Affiliation:YUAN Ning-yi1,LI Jin-hua1,LI Ge2
Abstract:Based on the model of the two phases of grain and grain boundary, the resistivity of the VO2 film prepared by Ion Beam Enhanced Deposition (IBED) method was studied. The lattice distortionhypothesis and grain boundary tunneling are supposed to simulate the resistivity change of the VO2 polycrystalline film with temperature. Due to the present of Ar+in interstitial site of VO2 lattice, some grains begin the semiconductor-to-metal phase transition at 48oC lower than the phase transi-tion temperature of VO2 single crystal.
Keywords:VO2 polycrystalline film  ion beam enhanced deposition  lattice distortion  grain boundarytunneling
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