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ZnO过渡层对BiFeO_3薄膜铁电性能的影响
引用本文:王贵,陈长春,高虹.ZnO过渡层对BiFeO_3薄膜铁电性能的影响[J].电子元件与材料,2012(9):16-18,22.
作者姓名:王贵  陈长春  高虹
作者单位:南京工业大学材料科学与工程学院
基金项目:南京工业大学材料化学工程国家重点实验室自主研究课题资助
摘    要:采用溶胶–凝胶法,在Pt(111)/Ti/SiO2/Si(100)衬底上采用逐层退火工艺制备了BFO(BiFeO3)、ZnO/BFO和ZAO(掺铝氧化锌)/BFO薄膜,研究了ZnO、ZAO过渡层对BFO薄膜晶相以及铁电、漏电和介电性能的影响。结果表明:与BFO薄膜相比,ZnO/BFO薄膜的表面更加致密、平整,结晶性更好,双剩余极化强度(2Pr)有非常大的提高,漏电和介电性能也均有改善。ZAO/BFO薄膜的铁电性能比ZnO/BFO薄膜的铁电性能差,这与ZAO的导电性强于ZnO有关。

关 键 词:溶胶–凝胶法  铁电性能  BiFeO3薄膜  ZnO过渡层

Effects of ZnO buffer layer on the ferroelectric properties of BiFeO3 thin films
WANG Gui,CHEN Changchun,GAO Hong.Effects of ZnO buffer layer on the ferroelectric properties of BiFeO3 thin films[J].Electronic Components & Materials,2012(9):16-18,22.
Authors:WANG Gui  CHEN Changchun  GAO Hong
Affiliation:(College of Materials Science and Engineering,Nanjing University of Technology,Nanjing 210009,China)
Abstract:BFO(BiFeO3),ZnO/BFO and ZAO(Al doped ZnO)/BFO thin films were deposited on the Pt(111)/Ti/SiO2/Si(100) substrates by the sol-gel method and the step-annealing technique.The effects of ZnO and ZAO buffer layers on the crystalline phases,ferroelectric properties,dielectric properties and the leakage current characteristics of the BFO films were studied.The results show that: compared with the BFO films,the ZnO/BFO films show a denser and smoother surface,higher degree of crystallization,larger double-remanent-polarization value,and improved dielectric properties and leakage current characteristics.The ferroelectric properties of the ZAO/BFO thin films is inferior to that of the ZnO/BFO thin films,probably attributed to that the ZAO thin film is more conductive than the ZnO thin film.
Keywords:sol-gel method  ferroelectric properties  BiFeO3 films  ZnO buffer layer
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