| Dependence of Magnetic Properties and Microstructure of Ni81Fe19 Film on Base Vacuum and Sputtering Pressure |
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| 作者姓名： | HongchenZhao HongSi |
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| 作者单位： | [1]MaterialsScienceandEngineeringSchool,UniversityofScienceandTechnologyBeijing100083,China [2]CentralIronandSteelResearchInstitute,Beijing100081,China |
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| 摘 要： | The Ni81Fe19/Ta films with different NiFe thickness were prepared at different base vacuums and sputtering pressures,The results of magnetic measurement and atomic force microscope(AFM),showed that the films prepared at higher base vacuum and lower sputtering pressure had larger ΔR/R,The reason should be that higher base vacuum and lower sputtering pressure introduce larger grain-size and lower surface roughnes,which will weaken the scattering of electrons,reduce the resistance R,and increase ΔR/R.
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| 关 键 词： | 镍铁薄膜 磁性质 微结构 减射压强 |
Dependence of Magnetic Properties and Microstructure of Ni81Fe19 Film on Base Vacuum and Sputtering Pressure |
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| Hongchen ZHAO,Guanghua Yu,Shizhang Shu,Hong Si.Dependence of Magnetic Properties and Microstructure of Ni81Fe19 Film on Base Vacuum and Sputtering Pressure[J].Journal of University of Science and Technology Beijing,2002,9(1):45-47. |
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| Authors: | Hongchen ZHAO Guanghua Yu Shizhang Shu Hong Si |
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| Abstract: | The Ni81Fe19 / Ta films with different NiFe thickness were prepared at different base vacuums and sputtering pressures. The results of magnetic measurement and atomic force microscope (AFM) showed that the films prepared at higher base vacuum and lower sputtering pressure had larger R/R. The reason should be that higher base vacuum and lower sputtering pressure introduce larger grain-size and lower surface roughness, which will weaken the scattering of electrons, reduce the resistance R, and increase R/R. |
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| Keywords: | NiFe film anisotropic magnetoresistance surface roughness grain-size |
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