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Study of the nanoscopic deformation of an annealed nafion film by using atomic force microscopy and a patterned substrate
Authors:Maeda Yuta  Gao Yanfeng  Nagai Masayuki  Nakayama Yosuke  Ichinose Takuya  Kuroda Reiko  Umemura Kazuo
Affiliation:

aGraduate School of Energy Science and Nuclear Engineering, Musashi Institute of Technology, 1-28-1 Tamazutsumi, Setagaya, Tokyo 158-8557, Japan

bResearch Center for Energy and Environment Science, Musashi Institute of Technology, 1-28-1 Tamazutsumi, Setagaya, Tokyo 158-8557, Japan

cFaculty of Engineering, Musashi Institute of Technology, 1-28-1 Tamazutsumi, Setagaya, Tokyo 158-8557, Japan

dThe University of Tokyo, 3-8-1 Komaba, Meguro-ku, Tokyo 153-8902, Japan

eKuroda Chiromorphology Project, ERATO-SORST, 4-7-6 Park Building, Komaba, Meguro-ku, Tokyo 153-0041, Japan

fKamoshita Planning, SP1112-5-15-1, Ginza, Chuo-ku, Tokyo 104-8238, Japan

Abstract:We demonstrated the repetitive imaging of the same area of a nafion film before and after annealing by using atomic force microscopy (AFM). In order to find the exact same area of the same sample after changing the cantilever and reattaching the sample, a micropatterned substrate was developed. A micropattern with a 250–500 μm pitch was prepared on the backside of a transparent glass substrate. This pattern includes various signs such as colored letters and numbers at the center of each lattice of the pattern. The nanostructures fabricated by AFM nanolithography on a nafion film using this new method were successfully characterized before and after annealing (over 100 °C). The AFM images clearly showed that the nanostructures on a nafion film were dramatically changed by annealing. The data indicated an evidence to understand why the nafion fuel cell does not work well at high temperatures. Our method is probably effective for the study of nanoscopic dynamics in various surface structures.
Keywords:Atomic force microscopy (AFM)   Micropattern   Relocation   Nafion   Nanolithography   Annealing
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