| 宽束冷阴极离子源及其应用 |
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| 引用本文： | 严一心,卢进军,刘卫国,刘吉祥,王树棠.宽束冷阴极离子源及其应用[J].西安工业学院学报,1989(4). |
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| 作者姓名： | 严一心 卢进军 刘卫国 刘吉祥 王树棠 |
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| 作者单位： | 西安工业学院仪器工程系，西安工业学院仪器工程系，西安工业学院仪器工程系，西安工业学院仪器工程系，西安工业学院科研处 |
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| 摘 要： | 本文介绍一种新研制的用于离子束辅助淀积薄膜的宽束冷阴积离子源,与目前国内外普遍采用的考夫曼(Kaufman)型热阴极离子源相比,它具有寿命长,无污染,结构简单,所需供电电源少,操作方便等优点。实验结果证明,用宽束冷阴极离子源进行离子束辅助淀积所得 Zns 膜层强度超过国标规定的10倍,G|AlSIO_x|A膜层强度超过国标规定的8倍。该离子源有广泛的应用前景。
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| 关 键 词： | 离子源 辉光放电 离子束辅助淀积 薄膜淀积 |
BROAD BEAM COID CATHOD ION SOURCE AND ITS APPIICATION |
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| Yan Yixin Lu ginjun Liu Weiguo Liu Jixiang Wang Shutang.BROAD BEAM COID CATHOD ION SOURCE AND ITS APPIICATION[J].Journal of Xi'an Institute of Technology,1989(4). |
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| Authors: | Yan Yixin Lu ginjun Liu Weiguo Liu Jixiang Wang Shutang |
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| Affiliation: | Yan Yixin Lu ginjun Liu Weiguo Liu Jixiang Wang Shutang |
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| Abstract: | The paper introduces a newly-developed broad beam cold cathod ion source used for ion-assisted-deposition of thin films.Compared with Kaufman-type hot cathod ion source widely used at home and abroad,it has many advantages of long life,unpollution,simple construction,less power,easy operation,etc..The strength of ZnS films and G|AlSiO_x|A films deposited by ion-assisted-deposition with broad beam cold cath- od ion source are separately 10 times and 8 times higher than that stipulat- ed for by National Standard.This ion source will find wider and wider application. ., |
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| Keywords: | ion source glow diseharge ion-assisted-deposition thin film deposition |
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