首页 | 本学科首页   官方微博 | 高级检索  
     

基于动态曝光的激光光刻机的设计
引用本文:殷庆纵,张宇峰,刘吉.基于动态曝光的激光光刻机的设计[J].测控技术,2014,33(10):136-139.
作者姓名:殷庆纵  张宇峰  刘吉
作者单位:1. 苏州工业职业技术学院电子与通信工程系,江苏苏州,215104
2. 苏州印象镭射有限公司,江苏苏州,215004
基金项目:苏州市科技局计划项目(SYN201332)
摘    要:为了提高激光全息防伪技术,开发了以工业控制计算机为上位机、DSP TMS320F2812为下位机的高速光刻机。该光刻机采用动态曝光的工作方式,实现了高速高精度定位。解决了传统光刻机需要在静止的状态下完成曝光的工作模式,使光刻速度提高了20~30倍,提高了激光防伪商标母板制作的技术水平。

关 键 词:动态曝光  激光  光刻  光栅  D图像  DSP  FPGA

Design of Laser Lithography Machine Based on Dynamic Exposure
YIN Qing-zong , ZHANG Yu-feng , LIU Ji.Design of Laser Lithography Machine Based on Dynamic Exposure[J].Measurement & Control Technology,2014,33(10):136-139.
Authors:YIN Qing-zong  ZHANG Yu-feng  LIU Ji
Abstract:In order to improve the laser holographic anti-counterfeiting technology,a high-speed lithography machine is developed,which is taken industrial control computer as the upper machine and DSP TMS320F2812 as under machine.The lithography machine works at dynamic exposure,and realizes high speed and high precision positioning.The problem that the traditional lithography needs to complete exposure mode under static conditions is solved,lithography speed is increaed by 20~30 times,the motherboard production technology of laser anti-counterfeiting trademarks is improved.
Keywords:dynamic exposure  laser  lithography  gratings  3D image  DSP  FPGA
本文献已被 CNKI 万方数据 等数据库收录!
点击此处可从《测控技术》浏览原始摘要信息
点击此处可从《测控技术》下载全文
设为首页 | 免责声明 | 关于勤云 | 加入收藏

Copyright©北京勤云科技发展有限公司  京ICP备09084417号