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| 低介电常数聚酰亚胺薄膜的制备与性能研究 | |
| 引用本文： | 贾红娟,尹训茜,查俊伟,施昌勇,党智敏. 低介电常数聚酰亚胺薄膜的制备与性能研究[J]. 功能材料, 2011, 42(9) |
| 作者姓名： | 贾红娟 尹训茜 查俊伟 施昌勇 党智敏 |
| 作者单位： | 1. 北京化工大学化工资源有效利用国家重点实验室,北京,100029 2. 北京化工大学化工资源有效利用国家重点实验室,北京100029／北京科技大学化学与生物工程学院高分子科学与工程系,北京100083 3. 北京服装学院基础部,北京,100029 |
| 基金项目： | 国家自然科学基金资助项目(50977001,51073015); 科技部中欧国家合作资助项目(2010DFA51490) |
| 摘 要： | 用单体4,4′-二胺基二苯醚（ODA）和均苯四甲酸二酐（PMDA）添加纳米SiO2,在溶剂N,N-二甲基乙酰胺（DMAC）中,采用原位聚合法合成SiO2/聚酰亚胺（PI）复合薄膜。用氢氟酸刻蚀SiO2纳米粒子,引入纳米微孔,形成含有微孔的PI薄膜。造孔剂含量为15%时,薄膜的介电常数从纯聚酰亚胺的3.54降低至3.05（1kHz）。用透射电镜表征微孔结构,分析了微孔孔径和造孔剂（SiO2）含量对薄膜介电常数、耐热性、疏水性和机械强度等性质的影响。 |
| 关 键 词： | 聚酰亚胺 介电常数 SiO2 纳米微孔 |
Preparation and properties of nanoporous polyimide films with low dielectric permittivity |
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| JIA Hong-juan,YIN Xun-qian,ZHA Jun-wei,,SHI Chang-yong,DANG Zhi-min. Preparation and properties of nanoporous polyimide films with low dielectric permittivity[J]. Journal of Functional Materials, 2011, 42(9) | |
| Authors: | JIA Hong-juan YIN Xun-qian ZHA Jun-wei SHI Chang-yong DANG Zhi-min |
| Affiliation: | JIA Hong-juan1,YIN Xun-qian1,ZHA Jun-wei1,2,SHI Chang-yong3,DANG Zhi-min1,2(1.State Key Laboratory of Chemical Resources Engineering,Beijing University of Chemical Technology,Beijing 100029,China,2.Department of Polymer Science and Engineering,School of Chemistry and Biological Engineering,University of Science & Technology Beijing,Beijing 100083,3.Elements Department,Beijing Institute of Fashion Technology,China) |
| Abstract: | SiO2/polyimide(PI) nanocomposite films with low dielectric permittivity with diamines of pyromellitic dianhydride(PMDA) and 4,4-oxydianiline(ODA) were successfully synthesized by a wet phase inversion process.Then removal of the silica cores of the nano-composite films by HF etching gives rise to the nanoporous of PI films.It is found that the dielectric permittivities of the porous films can be reduced from 3.54 of the pure PI to 3.05(1kHz) by using 15 wt% pore-former(SiO2).The nanopores were characterized... |
| Keywords: | polyimide(PI) dielectric permittivity SiO2 nanoporous |
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