| 我国模压全息技术发展现况述评 |
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| 引用本文： | 熊秉衡.我国模压全息技术发展现况述评[J].云南工业大学学报,1993(2). |
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| 作者姓名： | 熊秉衡 |
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| 作者单位： | 云南工学院激光研究所 |
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| 摘 要： | 模压全息技术作为一种高科技已在近年来得到迅速的发展并趋于成熟,模压全息能以较低的成本和较高的速度进行大批量的工业化生产。本文对我国模压全息技术发展现况进行了述评。
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| 关 键 词： | 模压全息 衍射图纹模压箔 全息标志 |
Review on the Devlopment of Embossing Technology |
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| Authors: | Xiong Binghen |
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| Affiliation: | Laser Research Institute |
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| Abstract: | Embossing holography, as a high techology, has been developed quickly and become mature in recent years. Embossing holograms can be put into mass industrial production with low cost and high speed. In this paper, some views on the development of embossing techology are presented. |
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| Keywords: | embossing holograms diffraction pattern embossing foil holographic labels |
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