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Use of Michelson and Fabry-Perot interferometry for independent determination of the refractive index and physical thickness of wafers
Authors:Gillen Glen D  Guha Shekhar
Affiliation:Air Force Research Laboratory, Materials and Manufacturing Directorate, Anteon Corporation, Wright-Patterson Air Force Base, Dayton, Ohio, USA. ggillen@anteon.com
Abstract:We present a method to independently measure the refractive index and the thickness of materials having flat and parallel sides by using a combination of Michelson and Fabry-Perot interferometry techniques. The method has been used to determine refractive-index values in the infrared with uncertainties in the third decimal place and thicknesses accurate to within +/- 5 microm for materials at room and cryogenic temperatures.
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