| 红外焦平面阵列非均匀性的两点校正及依据 |
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| 引用本文： | 刘会通,易新建.红外焦平面阵列非均匀性的两点校正及依据[J].红外与激光工程,2004,33(1):76-78. |
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| 作者姓名： | 刘会通 易新建 |
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| 作者单位： | 华中科技大学,光电子工程系,湖北,武汉,430074;华中科技大学,图像识别与人工智能研究所,湖北,武汉,430074 |
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| 摘 要： | 以Planck辐射定律和红外探测元的线性响应模型为基础，在理论上完整地推导了红外焦平面阵列非均匀性的两点校正方法；据此，论证了两点校正方法的物理依据，即从理论上证明如果探测元是线性和稳定响应的，该方法则可以实现非均匀性的准确校正；初步分析了非均匀性校正中存在误差的问题。
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| 关 键 词： | 红外焦平面阵列 非均匀性 线性校正 |
| 文章编号： | 1007-2276(2004)01-0076-03 |
| 收稿时间： | 2003/5/14 |
| 修稿时间： | 2003年5月14日 |
Two-point nonuniformity correction for IRFPA and its physical motivation |
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| LIU Hui-tong,YI Xin-jian.Two-point nonuniformity correction for IRFPA and its physical motivation[J].Infrared and Laser Engineering,2004,33(1):76-78. |
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| Authors: | LIU Hui-tong YI Xin-jian |
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| Affiliation: | LIU Hui-tong~1,YI Xin-jian~2 |
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| Abstract: | The two-point nonuniformity correction algorithm for IRFPA is theoretically and perfectly deduced based on Planck Law and the linear response model of infrared detector. The physical motivation of the two-point nonuniformity correction is hereby disserted for the first time. It is theoretically proved that the algorithm is perfect for nonuniformity correction provided that the response of IRFPA is linear and stable. The residual nonuniformity is initiatively analyzed. |
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| Keywords: | IRFPA Nonuniformity Linear correction |
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